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View port device for plasma process and process observation device of plasma apparatus

A plasma and observation device technology, applied in the field of plasma production process observation devices, can solve the problems of affecting the stability of the gas flow field in the reaction chamber, high cost, complex processing of honeycomb structure shutters, etc.

Inactive Publication Date: 2012-05-23
IND TECH RES INST
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, the honeycomb structure shutter of this method is complicated and costly to process, and additional vacuum lines, valves, sealing devices, etc. are required at the same time
In addition, the air flow introduced may affect the stability of the air flow field in the reaction chamber

Method used

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  • View port device for plasma process and process observation device of plasma apparatus
  • View port device for plasma process and process observation device of plasma apparatus
  • View port device for plasma process and process observation device of plasma apparatus

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Embodiment Construction

[0040] The spirit of the present invention is to design at least one diffusion space in the observation through-hole structure of the plasma manufacturing process window, through which the active reaction species entering the observation through-hole can be deposited on the surface of the diffusion space, thereby reducing the number of active reaction species The amount deposited on the window glass.

[0041] figure 1 A three-dimensional perspective view of the window element of the first embodiment is shown. Please refer to figure 1 , the window element 2 may include a first substrate portion 4 , a second substrate portion 6 , a connecting portion 8 and a mesh element 10 . The first substrate part 4 has a first through hole 12 . The second substrate part 6 has a second through hole 14 and a second through hole diffusion space 16 . The mesh element 10 can be made of metal, such as stainless steel mesh, aluminum mesh or titanium mesh, and has observation holes 21 . The mes...

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Abstract

A view port device for a plasma process and a process observation device of a plasma apparatus are provided. The view port device for a plasma process comprises a first substrate portion, a second substrate portion, and a connecting portion. The first substrate portion has a first through hole. The second substrate portion has a second through hole and a second diffusion space. A cross-sectional area of the second diffusion space is larger than that of the second through hole. The connecting portion is disposed between the first substrate portion and the second substrate portion.

Description

technical field [0001] The invention relates to a window element, in particular to a plasma manufacturing process observation device with a window element. Background technique [0002] Thin film deposition and etching can be performed using a plasma-assisted chemical vapor deposition process. The results of film deposition and etching are closely related to the concentration of active reactant species in the fabrication process. Therefore, it is very important to observe and analyze the concentration variation among active reactant species in the plasma fabrication process environment. [0003] For example, one method of observing the plasma-assisted chemical vapor deposition process is to use an optical emission spectrometer (Optical Emission Spectroscopy; OES) to capture the plasma spectrum of the active reactant species in the reaction chamber from outside the chamber through, for example, a window glass Changes, and then grasp the concentration of the reacting species...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44
CPCC23C16/44C23C16/50H01J37/32798H01J37/32935
Inventor 杜陈忠梁沐旺林冠宇魏大钦
Owner IND TECH RES INST
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