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Annular uniform airflow power supplying device

A powder supply device and ring-shaped technology, which is applied in the field of ion plasma preparation of nanomaterials, can solve the problems of short residence time and difficult evaporation, and achieve high-quality results

Inactive Publication Date: 2012-03-14
BEIHANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Raw material particles are not easily evaporated completely in this plasma reactor due to the high flow rate and short residence time in the reactor channel, while particle evaporation requires a relatively long time or a long reactor channel

Method used

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  • Annular uniform airflow power supplying device
  • Annular uniform airflow power supplying device
  • Annular uniform airflow power supplying device

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Embodiment Construction

[0024] The present invention will be described in detail below in conjunction with accompanying drawing

[0025] A kind of annular uniform airflow powder supply device that the present invention proposes, such as figure 1 As shown, it includes a plasma generator 1 , a quenching gas delivery pipe 2 , a raw material injection ring 3 , a quenching chamber 4 , a collecting chamber 5 and a cooling water pipe 6 .

[0026] The plasma generator 1 is provided with a cooling water inlet 101 and a cooling water outlet 102, the cooling water enters through the cooling water inlet 101 of the plasma generator 1, flows out from the cooling water outlet 102, and the cooling water flows through the plasma generator 1 to ensure its temperature within a certain range. The plasma generator 1 is embedded in the hollow recess of the ring fence frame 303 of the raw material injection ring 2 . The raw material injection ring 2 is connected with the quenching chamber 3 by bolts.

[0027] Such as ...

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Abstract

The invention discloses an annular uniform airflow power supplying device, belonging to the technical field of the preparation of a nanometer material by using direct-current arc plasma. The device comprises a plasma generator, a raw material injection ring, a quenching chamber, a collection chamber, a reverse quenching injection pipe and a cooling water pipe, wherein the plasma generator is provided with a cooling water inlet and a cooling water outlet, and is embedded in a notch of an annular fence frame of the raw material injection ring; the raw material injection ring comprises an outer ring, tangential inlets, the annular fence frame and a power supply mixing cavity; the outer ring is uniformly provided with tangential inlets; the center of the outer ring is provided with the hollowannular fence frame; the raw material injection ring is fixedly connected with the quenching chamber; and the collection chamber comprises an upper end of the collection chamber and a lower end of the collection chamber. According to the invention, raw material particles are injected into high-temperature plasma jet by the annular fence frame; therefore the distribution of the raw material is more uniform, and the melting and evaporation are more sufficient; and thus nanometer powder materials with higher quality are obtained.

Description

Technical field: [0001] The invention belongs to the technical field of preparing nanometer materials by DC arc plasma, and in particular relates to an annular uniform airflow powder supply device. Background technique: [0002] The preparation method of thermal plasma nanomaterials has been widely used, because the arc plasma and its jet generated by gas discharge, the gas temperature is as high as several thousand degrees, or even tens of thousands of degrees, which can melt almost all substances, and can be compared with Conveniently control the ambient atmosphere of gas discharge (such as discharge under anaerobic conditions, etc.). In addition, using the thermal plasma method, not only simple nanomaterials but also alloy nanomaterials can be prepared. The preparation of elemental nanomaterials by thermal plasma has the characteristics of simple required equipment, convenient operation, high yield, and wide application range. It has been successfully used to prepare ele...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/42B82Y40/00
Inventor 王海兴孙维平刘小龙
Owner BEIHANG UNIV
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