Optical system wave aberration detection device

Abstract

The invention discloses an optical system wave aberration detection device, relates to the technical field of optical measurement and solves the problem that the existing optical system wave aberration detection device has deflection error and translation error in the phase shift process. Two beams of common-path orthogonal line polarized light emitted from a light splitting system are split by asecond polarization splitting prism, a reference light and a testing light are coupled to a reference optical fiber and a testing optical fiber with a motor-driven polarization controller through a first coupling lens and a second coupling lens; a light emitted from the testing optical fiber is irradiated to a coated end face of the reference optical fiber by a detected optical system and is reflected, a first pyramid prism is adjusted so that a test spherical wave and a reference spherical wave generate interference, a second pyramid lens which is insensitive to the deflection error is movedby a piezoelectric ceramic so as to realize the phase shift process; a second plane mirror enables the wave aberration detection device to be insensitive to the translation error in the phase shift process; an interference image is acquired by using a photoelectric detector, and is input into the computer to be processed and analyzed by using a phase shift algorithm; therefore, the optical systemwave aberration is obtained.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to an optical system wave aberration detection device. Background technique [0002] Extreme ultraviolet lithography is a next-generation lithography technology based on traditional optical lithography, which inherits the development achievements of current optical lithography to the greatest extent. The working wavelength of extreme ultraviolet lithography is the extreme ultraviolet band of 13-14nm. There are major differences between traditional optical lithography and detection technology. As one of the core unit systems of the lithography machine, in order to achieve the requirements of lithography resolution and critical dimension control, the RMS wave aberration of the optical system should be less than λ / 20. Such a high-precision optical system requires a higher-precision detection device. At present, the more advanced interferometer products of Zygo and Wyko co...

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Problems solved by technology

[0012] The present invention provides a wave aberration detection device for an optical system to solve the problem of yaw error and lateral shift error in the phase shifting process of the existing optical system wave aberration detection device

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