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An assembly and adjustment device for projection objective lens of lithography machine

A technology of projection objective lens and lithography machine, which is applied in the direction of exposure device of photoplate making process, exposure equipment of microlithography, etc., can solve the problems of difficult to achieve high-precision assembly, real-time detection and automatic adjustment, and meet the requirements of high-precision assembly tolerance , Improve the efficiency of assembly and adjustment, and the effect of good real-time performance

Inactive Publication Date: 2011-12-14
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the problem that the existing lithography projection objective lens is difficult to realize high-precision assembly, real-time detection and automatic adjustment, the invention provides an assembly and adjustment device for the projection objective lens of lithography machine

Method used

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  • An assembly and adjustment device for projection objective lens of lithography machine
  • An assembly and adjustment device for projection objective lens of lithography machine
  • An assembly and adjustment device for projection objective lens of lithography machine

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specific Embodiment approach 1

[0015] Specific implementation mode 1. Combination figure 1 and figure 2 Describe this embodiment, an installation and adjustment device for projection objective lens of a lithography machine, the device includes a Z-axis column 1, an upper detection column 2, an upper detection head 3, a movable adjustment platform 6, an air bearing turntable 7, and a horizontal marble platform 8. The adjustment mechanism 9, the vibration isolation support leg 10 and the adjustment platform connecting bracket 11; the Z-axis column 1, the upper detection column 2 and the air flotation turntable 7 are respectively vertically fixed on the horizontal marble platform 8; the upper detection head 3 passes through The upper detection head frame 3-1 is fixed on the upper detection column 2, the adjustment mechanism 9 is fixed on the upper surface of the movable adjustment platform 6, and the movable adjustment platform 6 is fixed on the Z-axis column 1 through the adjustment platform connection brack...

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Abstract

The invention discloses a device for assembling and regulating a lens of a projection objective of a lithography machine and relates to the technical field of manufacturing, assembly and regulation of the lens of the projection objective of a deep ultraviolet lithography machine. By the device, high-precision automatic assembly, detection and regulation of the lens of the lithography projection objective are realized. The device comprises a Z-axis stand column, an upper detection stand column, an upper detection head, a movable regulation platform, an air floatation rotary table, a horizontalmarble platform, a regulation mechanism, four vibration isolation supporting legs and a regulation platform connection bracket, wherein the Z-axis stand column, the upper detection stand column and the air floatation rotary table are vertically fixed on the horizontal marble platform respectively; the upper detection head is fixed on the upper detection stand column through an upper detection head frame; the regulation mechanism is fixed on the upper surface of the movable regulation platform; the movable regulation platform is fixed on the Z-axis stand column through the regulation platform connection bracket; and the horizontal marble platform is supported on a vibration isolation foundation through the four vibration isolation supporting legs. The device has high instantaneity and greatly improves the assembly and regulation efficiency of the lithography projection objective.

Description

technical field [0001] The invention relates to the technical field of manufacturing and adjusting projection objective lenses of deep ultraviolet lithography machines, in particular to an assembly and adjustment platform for assembling, detecting and adjusting projection objective lenses of lithography projection. Background technique [0002] The requirements for the existing lithography objective lens are: 1. imaging quality with diffraction limit, 2. high resolution, 3. large field of view and minimal distortion; therefore, the processing, manufacturing and assembly of lithography projection objective lens is a very Sophisticated and complex process. In recent decades, with the miniaturization of semiconductor chips and the improvement of integration requirements, people have higher and higher requirements for lithography lenses. In order to achieve high-quality imaging performance and obtain higher resolution, high-NA projection lithography objective lenses require opt...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 巩岩张巍倪明阳赵磊王学亮袁文全
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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