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Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus

A technology of equipment and controllers, applied in microlithography exposure equipment, optomechanical equipment, printing equipment, etc., can solve unexpected problems

Inactive Publication Date: 2011-09-21
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesired or unpredictable effects

Method used

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  • Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus
  • Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus
  • Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus

Examples

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Embodiment Construction

[0027] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The equipment includes:

[0028] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0029] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM configured to precisely position the patterning device MA according to determined parameters;

[0030]- a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and associated with a second positioning device configured to precisely position the substrate W according to determined parameters PW connected; and

[0031] - a projection system (e.g. a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA on...

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PUM

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Abstract

The invention discloses a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.

Description

technical field [0001] The present invention relates to a lithographic apparatus and a method of manufacturing devices using the lithographic apparatus. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred via imaging to a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of successively patterned adjacent target portions. Known lithographic apparatus...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03B27/52G03F7/70341H01L21/0274
Inventor R·W·L·拉法瑞M·瑞鹏R·H·M·考蒂R·J·梅杰尔斯F·伊凡吉里斯塔
Owner ASML NETHERLANDS BV
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