Energy band transmutation multiplication region structure for avalanche photodiode, and preparation method of energy band transmutation multiplication structure
A technology of avalanche photoelectricity and multiplication zone, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problem of increasing excess noise, achieve the effect of reducing excess noise and improving the ionization rate difference between electrons and holes
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[0029] (1) need to grow In 0.53 Ga 0.47 As avalanche photodiode epitaxial material, the absorption region charge region and the multiplication region are separated, with a transition layer (SAGCM) structure, semi-insulating or conductive InP single crystal material is used as the substrate of the detector, InP material is used as a buffer layer and Si is used for high Doping (at the same time as the lower contact layer, n>2×10 18 cm -3 ), In 0.53 Ga 0.47 The As material is used as the absorber layer for low doping Si or no doping (n~2×10 16 cm -3 ), lower doped Si In 0.52 Al 0.48 As as the charge layer (n~2×10 17 cm -3 ), without doping In 0.53 Ga 0.47 As / In 0.52 Al 0.48 The As superlattice is used as the transition layer between the absorption layer and the charge layer, and the multiplication region uses undoped four layers of In with different compositions. 0.52 Al x Ga 0.48-x The As material constitutes an energy band gradient structure, and the schematic dia...
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