Polrvinyl chloride heat-resistance modifier and preparation method thereof
A heat-resistant modifier and polyvinyl chloride technology, which is applied in the field of polyvinyl chloride heat-resistant modifier and its preparation, can solve the problems of low thermal deformation temperature, poor thermal stability, high brittleness, etc. The effect of good particle shape and low cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0027] The raw material mass ratio of methyl methacrylate, α-methylstyrene, N-phenylmaleimide is 30: 30: 40, and the preparation method of heat-resistant modifier is as follows:
[0028] (1) Monomer preparation: Add methyl methacrylate and α-methylstyrene into the configuration tank, start stirring, slowly add N-phenylmaleimide into it, stir for half an hour, wait for N-phenyl Basemaleimide is ready to use after all dissolving;
[0029] (2) Preparation of polymerization aids:
[0030] a. Initiator solution preparation: the initiator is prepared into an aqueous solution with a mass ratio of 3% for use, and the initiator adopts peroxide;
[0031] b. Preparation of emulsifier solution: add water and emulsifier in the configuration tank, the mass ratio is 85:15, stir evenly at room temperature, and use potassium hydroxide to adjust the pH value of the emulsifier solution to 9-10 for later use, emulsify The agent adopts alkyl sulfate or alkyl sulfonate;
[0032] (3) Aggregation:...
Embodiment 2
[0038] The preparation method is the same as in Example 1, and the mass ratio of the raw materials of methyl methacrylate, α-methylstyrene and N-phenylmaleimide is 35:35:30.
Embodiment 3
[0040] The preparation method is the same as in Example 1, and the mass ratio of the raw materials of methyl methacrylate, α-methylstyrene and N-phenylmaleimide is 37.5:37.5:25.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com