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Nanometer-resolution total-reflection differential micrometric displacement measurement method and device

A total reflection and differential technology, applied in measurement devices, optical devices, instruments, etc., can solve the problems of expensive system, complicated adjustment, limited resolution, etc., to achieve a simple measurement system, overcome optical power fluctuations, and improve sensitivity. Effect

Inactive Publication Date: 2011-07-13
ZHEJIANG UNIV
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Problems solved by technology

However, its resolution is limited by the size of the pinhole and the numerical aperture of the microscope objective, and is affected by the fluctuation of the external background and the light source itself.
In order to improve its axial resolution, in the Chinese patent No. 200510123581.9, Zhao Weiqian and others proposed the idea of ​​differential confocal, using two receiving holes to stagger a certain position from the focal plane in the axial direction, and passing through The light intensity behind the two small holes is then differentially processed, which improves the axial resolution and eliminates the influence of optical power fluctuations and background noise on the measurement, but it requires two small holes, two detectors and relative adjustments Complex and thus expensive system

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Embodiment 1

[0034] Such as figure 1 As shown, a device for measuring nanometer-resolution total reflection differential micro-displacement, including: a laser 1, a single-mode fiber 2, a collimator lens 3, a depolarizing beam splitter 14, a microscopic objective lens 6, a target mirror 7, an orthorhombic Prism 8 , convex lens 9 , differential detector 10 , drive and display unit 11 .

[0035] The laser 1, the single-mode fiber 2 and the collimating lens 3 constitute the first component group in sequence, and the depolarization beam splitter 14 is the second component group, and the first component group and the second component group are sequentially located on the optical path of the light emitted by the laser 1 The microscopic objective lens 6 is the third component group, and the measured target lens 7 is located on the first transmission light path of the depolarization beam splitter 14 successively; the rhombic prism 8, the convex lens 9, the differential detector 10 and the drive an...

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Abstract

The invention discloses a nanometer-resolution total-reflection differential micrometric displacement measurement method and a nanometer-resolution total-reflection differential micrometric displacement measurement device. The device comprises a laser, a single mode fiber, a collimating lens, a depolarization spectroscope, a micro objective, a measured target mirror, a rhombic prism, a convex lens, a differential detector and a driving and display unit. The method comprises that: laser is filtered and collimated, and the filtered and collimated laser is vertically incident onto the depolarization spectroscope; the filtered and collimated laser sequentially passes through the micro objective to reach the measured target mirror, is reversely reflected, refracted by the micro objective and vertically incident into the depolarization spectroscope, enters the rhombic prism, and is totally reflected for at least once in the rhombic prism and emergent; and emergent light beams are converged and incident into the differential detector, signals are transmitted into a driving and display system of the detector to obtain voltage signals reflecting the position changes of the measured target mirror, and the position changes of the measured target mirror are displayed. The method and the device can be used for nanometer-resolution detection, and are widely applied in the field of industrial precision measurement and monitoring.

Description

technical field [0001] The invention belongs to the technical field of photoelectric detection, and in particular relates to a method and a device for high-precision micro-displacement measurement and monitoring. Background technique [0002] Today, nanotechnology, biotechnology, and high-end integrated circuit manufacturing technology have become important directions for the development of world science and technology. Fast and reliable nanoscale resolution detection technology plays an extremely important role in the research of nanotechnology, biotechnology, high-end integrated circuit manufacturing and other fields. The traditional microscopic measurement technology based on light interference has been able to obtain measurement resolutions as high as below 1nm. At present, the optical non-interference method for micro-displacement measurement is the most successful confocal method. The traditional confocal method is to use the point light source, the object to be measu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02
Inventor 匡翠方王婷婷库玉龙郝翔刘旭
Owner ZHEJIANG UNIV
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