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Priming method and priming apparatus

A technology for initiating filling and processing methods, applied to devices, optics, instruments, etc. for coating liquid on the surface, which can solve a large number of problems and achieve the effect of reducing usage, ensuring reliability, and reducing burden

Inactive Publication Date: 2011-05-04
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And, the conventional priming processing device in the past makes the priming roller continuously rotate as mentioned above every time the priming process is performed, and the entire outer peripheral surface (full circumference) of the priming roller is treated. Sprays cleaning fluid, so there is a problem of requiring a large amount of cleaning fluid (usually thinner)

Method used

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  • Priming method and priming apparatus

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Embodiment Construction

[0039] Next, preferred embodiments of the present invention will be described with reference to the attached drawings.

[0040] Structure of the start-up filling processing unit

[0041] figure 1 It is a figure which shows the structure of the priming processing apparatus which concerns on one Embodiment of this invention. This priming processing device is incorporated in a resist coating device (not shown) that performs resist coating by a non-spin coating method, for example, in a photolithography process for an LCD manufacturing process. coating process, and the priming processing device is disposed near a coating table (not shown) on which a substrate to be processed is placed or suspended for the resist coating process.

[0042] In the illustrated priming processing device, the casing 10 is composed of a long frame having a slit-shaped opening 12 on the upper surface, and the top of the casing 10 passes through the opening with the accommodating priming roller 14 . T...

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Abstract

The present invention provides a priming method and a priming apparatus, which can ensure priming reliability and can further reduce the using amount of cleaning liquid. An injection outlet of a slit type nozzle (72) is relative to a top part of a priming roller (14) parallelly. The slit type nozzle (72) is caused to eject a certain amount of liquid resist (R), and the liquid resist (R) is placed for a preset time period in a preset state. Then, the priming roller (14) is rotated for coating the liquid resist (R) on an outer peripheral surface. Then, the rotation speed of the priming roller (14) is increased momently for stopping the liquid film priming with a mode that the liquid film is separated to a split type nozzle (72) side and a priming roller (14) side. After the liquid film of the liquid resist (R) is stopped, the rotation of the priming roller (14) continues so the liquid resist (RM1) on the priming roller (14) arrives at a preset rotation angle position for standby.

Description

technical field [0001] The present invention relates to a priming treatment method and a priming treatment device for forming a liquid film of a treatment liquid near the discharge port of a slit nozzle used in spinless coating treatment , as a preliminary preparation for coating treatment. Background technique [0002] In the photolithography process in the manufacturing process of flat panel displays (FPD) such as LCDs, the non-spin coating method is often used. In this non-spin coating method, a long slit nozzle with a slit-shaped discharge port is scanned. In this way, resist liquid is coated on the substrate to be processed (for example, a glass substrate). [0003] In such a non-spin coating method, it is desirable to prevent the unevenness of the film thickness of the resist coating film and the unevenness of the coating, so that the resist liquid sprayed onto the substrate during the coating scanning process The meniscus formed around the back side of the slit nozz...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C5/02B05C11/10B05C11/02B05C11/00B05D1/26B05D7/00
CPCB05D1/265G03F7/16G03F7/2041G03F7/265G03F7/70341H01L21/0274
Inventor 若元幸浩竹熊贵志近藤大介
Owner TOKYO ELECTRON LTD
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