Super-junction metal oxide field effect transistor with surface buffering ring terminal structure
A field-effect transistor and terminal structure technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of increasing the manufacturing process, process difficulty and cost, increasing the lateral withstand voltage, reducing the surface electric field strength, reducing the The effect of surface electric field
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[0023] refer to figure 1 , a super junction metal oxide field effect transistor with a surface buffer ring terminal structure, comprising: an N-type doped semiconductor substrate 1, an N-type doped epitaxial layer is arranged on the N-type doped semiconductor substrate 1 2. A P-type doped deep well region 3 is provided inside the N-type doped epitaxial layer 2, and a P-type doped region 4 and a P-type doped region 4 are arranged on the upper side of the P-type doped deep well region 3. Doped buffer zone 5, N-type doped region 6 is set in the P-type doped region 4, the P-type doped region 4, the N-type doped region 6 and part of the N-type doped region The epitaxial layer 2 together constitutes the internal cell source region 11 of the super junction metal oxide field effect transistor, the P-type doped deep well region 3, the P-type doped buffer zone 5 and part of the N-type The doped epitaxial layer 2 together constitutes the terminal withstand voltage structure region 12 of...
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