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Recyclable sputtering target and manufacturing method thereof

A production method and technology of sputtering target, which are applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems of quality decline, inability to improve the quality of regenerated sputtering target material, etc., so as to reduce production cost , to avoid the effect of recycling and refining

Inactive Publication Date: 2010-08-18
SOLAR APPLIED MATERIALS TECHNOLOGY CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In view of the problem that the quality of the returned target material in the existing regenerated sputtering target material will decline after repeated regeneration procedures, but it still exists in the regenerated sputtering target material all the time, resulting in the regeneration of the sputtering target material The quality of the sputtering target cannot be improved, so after continuous research and testing, finally invented the production method of this regenerated sputtering target

Method used

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  • Recyclable sputtering target and manufacturing method thereof
  • Recyclable sputtering target and manufacturing method thereof
  • Recyclable sputtering target and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0053] After cutting the back of the target containing ruthenium with a predetermined thickness (cutting), the surface of the target is sprayed with carbon dioxide (CO 2 Spraying) to remove microparticles or pollutants; the raw material powder with the same composition as the target material is subjected to a desorption process for ≤5 hours under high-temperature vacuum (800 ° C ~ 1200 ° C), and the target The material is put into a mold, and the above-mentioned raw material powder is covered in the sputtering corrosion surface groove (erosion groove) and above the sputtering corrosion surface and back to the periphery of the target, and pre-pressing (pre-pressing) and heating Press sintering (1200-1400° C.; 300-450 bar; 100-400 min) to obtain a finished regenerated sputtering target.

[0054] The sintering status of the general regenerated sputtering target and the regenerated sputtering target produced in Example 1 was detected by ultrasonic testing (UT).

[0055] Please r...

example 2

[0057] After carrying out wire cutting (wire cutting) with a predetermined thickness on the back of the return target containing ruthenium, the surface of the return target is cleaned by ultrasonic (ultrasonics) to remove particles or pollutants; The raw material powder with the same composition as the target is subjected to desorption (desorption) process within ≤5 hours under high temperature vacuum (800°C~1200°C), and the target is put into a mold, and the above powder is filled in the The sputtering corrosion surface groove (erosion groove) and the top of the sputtering corrosion surface and back to the periphery of the target, and pre-pressing (pre-pressing) and hot pressure sintering (1000 ~ 1500 ° C; 20000 ~ 35000 psi; 100 ~ 300min), a finished regenerated sputtering target can be obtained. It can then be tested by ultrasonic testing (UT).

example 3

[0059] After the Ruthenium (Ruthenium) is returned to the back of the target for cutting (cutting) with a predetermined thickness (predetermined thickness), the surface of the target is returned to the surface of the target for carbon dioxide supercritical fluid (CO 2 supercritical fluid) to remove microparticles or pollutants; after the raw material powder with the same composition as the target material is subjected to desorption (desorption) process at high temperature and vacuum (800 ° C ~ 1200 ° C) for ≤ 5 hours, and The back target is put into a mold, and the powder is filled in the sputtering corrosion surface groove (erosion groove) and the top of the sputtering erosion surface and the periphery of the back target, and pre-pressing (pre-pressing), Hot pressing (1200-1400°C; 300-450bar; 100-400min) and hot isobaric sintering (1000-1500°C; 20000-35000psi; 100-300min) to obtain a finished regenerated sputtering target. It can then be tested by ultrasonic testing (UT).

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Abstract

The invention relates to a recyclable sputtering target and a manufacturing method thereof. The method comprises the following steps that: a return target is provided and comprises a back side, a sputtering erosion surface and a periphery, and the sputtering erosion surface comprises at least a sputtering erosion surface groove; the back side of the return target is pre-machined; and raw material powder with the same components with the return target is covered on the sputtering erosion surface of the return target, in the sputtering erosion surface groove and on the periphery, pre-pressed and sintered to obtain the recyclable sputtering target. The invention can control the proportion of the return target in the recyclable sputtering target, so that the proportion of the components of the first target returning is gradually reduced, so as to replace the old with the new and to keep the recyclable target sputtering quality.

Description

technical field [0001] The present invention is a method for manufacturing a refurbished sputtering target, in particular a method for manufacturing a refurbished target that can gradually eliminate regenerated targets. Background technique [0002] Physical vapor deposition (plasma vapor deposition) is widely used in thin film deposition of semiconductors, hard disks or optical discs. The most commonly used material is sputtering target, but the utilization rate of sputtering target is usually 25-40%, or even lower ; Generally, the used target (spent target) is usually discarded, so that the cost of the target cannot be reduced. Therefore, if the returned target itself contains a large amount of precious metal components, the returned target will be remelted, crushed, and then Electrolytic refining is recovered to produce high-purity powder, which can be re-fed to make new targets. [0003] Usually, the process of refining and recycling is cumbersome and relatively increas...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F7/04
Inventor 王子文詹智尧廖浩嘉
Owner SOLAR APPLIED MATERIALS TECHNOLOGY CORPORATION
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