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Nano/micron invisible nasal mask and production process and dedicated wearing device thereof

An invisible nasal mask and nanotechnology, which is applied in the field of human nasal filter devices, wearers, and invisible nasal masks, can solve the problems of unsatisfactory invisible effects of U-shaped rings, excessive area occupied by filter brackets, and high labor costs.

Inactive Publication Date: 2010-04-07
田在祥
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] "Nano invisible dustproof nasal mask and its manufacturing method" (public number: CN101269262A) and "nano invisible dustproof nasal mask and its hot pressing mold" (utility model patent number: ZL200820074720.2) and other two applications filed by the applicant earlier. These two patents respectively disclose an invisible dust-proof nasal mask composed of two elastic filter devices connected at both ends of a U-shaped ring, but the injection molding process of the U-shaped ring and filter bracket is extremely complicated in actual production , and the quality of the finished product is not easy to control. The invisible effect of the U-shaped ring in the nasal cavity is not ideal. The area occupied by the filter holder in the nasal cavity is too large, which will reduce its air permeability in the nasal cavity and increase the air permeability of the human nasal cavity. Foreign body feeling, and the process of directly laying the filter membrane on the hot pressing mold for hot pressing will press the filter membrane out of dead wrinkles, the fibers of the filter membrane will be stretched and deformed, and the labor cost is too high

Method used

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  • Nano/micron invisible nasal mask and production process and dedicated wearing device thereof
  • Nano/micron invisible nasal mask and production process and dedicated wearing device thereof
  • Nano/micron invisible nasal mask and production process and dedicated wearing device thereof

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Embodiment Construction

[0021] First made with plastic technology figure 1 For the elastic filter bracket with arc support 2, several metal tool plates with several pits are made, and there are grooves corresponding to the elastic filter bracket in the pits of the metal tool plates, and the figure 1 The elastic filter brackets are respectively embedded in the pits of the metal plate. In order to enable the fiber mat to be peeled off from the metal tool smoothly after spinning, a lubricant or release agent can be applied to the surface of the metal tool before spinning. Then, using melt spinning method or nano electrospinning method, the required high molecular polymer melt or solution is sprayed on a rotating metal plate equipped with several elastic filter holders, and the spun high molecular polymer A cross-linking agent is added to the material or the surface of the filter support, and the nano / micro fibers are attached to the elastic filter support through the cross-linking technology of the cro...

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Abstract

The invention discloses a nano / micron invisible nasal mask, a production process thereof, and a dedicated wearing device for wearing the invisible nasal mask. The nano / micron invisible nasal mask is provided with two elastic filter brackets consisting of arc supports (2) and O-shaped rings (1). Nano / micron filtration membranes (3) or external filtration membranes (4) are adhered on the filter brackets respectively so as to form two elastic filtering devices for a human nasal cavity. The two filtering devices are connected by an elastic band (5). The production process has simple design, and meets the essential requirements of industrial mass production. The wearing device is provided with two guiding heads (6) and two fan-shaped pushing limit pieces (7), and can assist to successfully push the two filtering devices into the human nasal cavity.

Description

technical field [0001] The invention relates to a daily necessities, which is an invisible nasal mask for people to use quickly and conveniently. connection. The invention also relates to the manufacturing process of the invisible nasal mask and a special wearer. Background technique [0002] "Nano invisible dustproof nasal mask and its manufacturing method" (public number: CN101269262A) and "nano invisible dustproof nasal mask and its hot pressing mold" (utility model patent number: ZL200820074720.2) and other two applications filed by the applicant earlier. These two patents respectively disclose an invisible dust-proof nasal mask composed of two elastic filter devices connected at both ends of a U-shaped ring, but the injection molding process of the U-shaped ring and filter bracket is extremely complicated in actual production , and the quality of the finished product is not easy to control. The invisible effect of the U-shaped ring in the nasal cavity is not ideal. Th...

Claims

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Application Information

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IPC IPC(8): A62B23/06D04H3/16
Inventor 田在祥
Owner 田在祥
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