Large-aperture imaging photon sieve and production method thereof

A manufacturing method and technology of photon sieves, applied in optics, diffraction gratings, optical elements, etc., can solve the problems of inability to manufacture large-diameter imaging photon sieves, achieve suppression of sidelobe effects and advanced diffraction, increase resolution, and focus imaging sharp effect

Inactive Publication Date: 2010-01-20
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the problem that the existing processing technology cannot produce large-diameter imaging photon sieves, another object of the present invention is to provide a method for manufacturing large-diameter imaging photon sieves, so that the existing processing technology can meet the production requirements of large-diameter photon sieves

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  • Large-aperture imaging photon sieve and production method thereof
  • Large-aperture imaging photon sieve and production method thereof
  • Large-aperture imaging photon sieve and production method thereof

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Embodiment Construction

[0034] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0035] An embodiment of the present invention provides a large-diameter imaging photon sieve, which includes a light-transmitting quartz substrate and an opaque metal chromium film plated thereon. The material of the light-transmitting substrate can also be ordinary glass or plexiglass. Optical material, the material of the opaque metal thin film can also be opaque metals such as gold, aluminum or copper; On the described opaque metal chromium thin film, some light-transmitting small holes are randomly distributed; the diameter of the quartz substrate The diameter of the photon sieve is 10cm, the diameter of the photon sieve is 80mm, the number of rings is 3000, the wavelength is 355nm, the focal length is 0.939m, the diameter of the light-transmitting hole on the outermost ring is 5μm, and the characteristic size is 3.33μm. Th...

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Abstract

The invention discloses a large-aperture imaging photon sieve and a production method thereof, which belong to the technical field of diffractive optical elements. The large-aperture imaging photon sieve comprises a transparent substrate and an opaque metal thin film plated on the transparent substrate, wherein, a plurality of transparent small holes are randomly distributed on the opaque metal thin film, and the transparent small holes which are randomly distributed lead diffraction light to generate mutual interference, thereby effectively suppressing sidelobe effect and high-level diffraction, improving resolution and obtaining more sharp focal spots. The production method adopts a Connes shaping function for shaping the small holes which are randomly distributed, thereby reducing the number of the holes, reducing the data amount of a layout, optimizing the overall distribution of the small holes, leading the imaging focal spots to be more sharp and leading the level of the existing processing technology to be capable of meeting the manufacturing needs of the large-aperture photon sieve.

Description

technical field [0001] The invention relates to the technical field of diffractive optical elements, in particular to a large-diameter imaging photon sieve and a manufacturing method thereof. Background technique [0002] The photon sieve is a new type of diffractive optical element based on the Fresnel zone plate. It replaces the area corresponding to the bright ring on the Fresnel zone plate with a large number of randomly distributed light-transmitting small holes, and the diameter of the small holes is the corresponding 1.53 times the width of the zone plate ring. These light-transmitting small holes randomly distributed in the position make the diffracted light interfere with each other, which can effectively suppress the side lobe effect and advanced diffraction, improve the resolution, and obtain a sharper focal spot. The resolution of the traditional zone plate in the imaging field depends on the width of its outermost ring, which is limited by the processing techno...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/00G02B5/18G02B27/44
Inventor 朱效立潘一鸣谢常青贾佳刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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