Voltage regulator circuit and resistance deviation compensation method

Abstract

The invention discloses a voltage adjuster circuit, which includes an operational amplifier. A positive direction inputting terminal of the operational amplifier receives input signal, an outputting terminal of the operational amplifier connects with a source follower composed of NMOS pipe, the operational amplifier also connect with a biasing circuit, the biasing circuit provides biasing signal to the operational amplifier. The invention also discloses a resistor tolerance compensation method, the circuit pole point is proportional to corresponding resistor, the resistor uses same technique variable direction resistor or same resistor, when resistor changes, the pole point moves towards to same direction on coordinate for compensating increase biasing and phase biasing caused by resistor variable. The circuit provided by the invention can reduce effect to the circuit increase and phase caused by factors such as technique biasing or temperature biasing efficiently, ensures the circuit property.

Description

technical field [0001] The invention relates to a circuit, especially a voltage regulator circuit. The invention also relates to a resistance deviation compensation method. Background technique [0002] Under the deep sub-micron process, there are large mismatches and deviations in the manufacturing process of integrated circuits, among which the resistance element is greatly affected by the process; usually the process deviation is considered to be ±20% in circuit design, when the system pole and When the resistance is related, the poles of the entire system will be affected by various influences. The offset will reach as much as ±20%, which may reduce the phase margin and gain margin that have just met the system stability requirements, thus seriously affecting the circuit system. Performance will also affect the yield of mass-produced products. This becomes a problem that all circuit designers have to consider. [0003] In order to solve this problem, the current main ...

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Problems solved by technology

[0002] Under the deep sub-micron process, there are large mismatches and deviations in the manufacturing process of integrated circuits, among which the resistance element is greatly affected by the process; usually the process deviation is considered to be ±20% in circuit design, when the system pole and When the resistance is related, the poles of the entire system will be affected by various influences. The offset will reach as much as ±20%, which may reduce the phase margin and gain margin that have just met the system stability requirements, thus seriously affecting the circuit system. performance, and will also affect the yield of mass-produced products

This has become a problem that all circuit designers have to consider

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