Non-volatile memory and preparation thereof
A non-volatile, manufacturing method technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, semiconductor devices, etc., can solve the problem that the coupling rate cannot be greatly improved
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[0044] Figure 2A to Figure 2F It is a top view of the fabrication process of the non-volatile memory according to the embodiment of the present invention. Figure 3A to Figure 3F for along Figure 2A to Figure 2F The cross-sectional view of the fabrication process of the non-volatile memory shown in the I-I' cross-section. Figure 4A to Figure 4F for the along Figure 2A to Figure 2F The cross-sectional view of the fabrication process of the non-volatile memory shown in the II-II' section.
[0045] First, please also refer to Figure 2A , Figure 3A and Figure 4A , providing a substrate 200. The substrate 200 is, for example, a silicon substrate. Then, a dielectric layer (not shown) and a conductive layer (not shown) are sequentially formed on the substrate 200 . The material of the dielectric layer is, for example, oxide, and its formation method is, for example, thermal oxidation. The material of the conductor layer is, for example, polysilicon, and its formation ...
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