DC magnetic filtering cathode vacuum arc plasma source
A cathode vacuum arc and plasma source technology, applied in the direction of plasma, gaseous chemical plating, coating, etc., can solve the problems of reducing the strength of the filtering magnetic field, affecting the stability of the arc discharge, and poor filtering effect of large particles. The effect of improving output efficiency
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specific Embodiment approach 1
[0021] Such as Figure 1 to Figure 2 As shown, the water-cooled anode cylinder 7 is provided with a truncated-conical cathode 1 installed on the cathode water-cooled seat 2, a trigger pin 4 connected with the trigger wire package 3, and stable wires are respectively wound up and down on the outside of the water-cooled anode cylinder 7. The arc coil 5 and the focusing coil 6, the deflection coil 10 is wound outside the water-cooled filter elbow 9, the lead-out coil 13 is wound outside the water-cooled lead-out straight pipe 12, and the arc discharge is connected between the water-cooled anode cylinder 7 and the cathode water-cooled seat 2 A power supply 16, a positive bias power supply 15 is connected between the water-cooled filter elbow 9 and the water-cooled anode cylinder 7
specific Embodiment approach 2
[0022] Such as image 3 As shown, on the basis of Embodiment 1, a resistor 14 is connected between the water-cooled anode cylinder 7 and the water-cooled straight pipe 12,
specific Embodiment approach 3
[0023] Such as Figure 4 As shown, on the basis of Embodiment 1, an air supply pipe 17 is added at the top of the water-cooled anode cylinder 7, and Ar, N 2 、C 2 h 2 Wait for the working gas to be sent into the plasma generation area 18, so that the working gas also participates in the plasma discharge,
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