Method and apparatus for thermal jet printing
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[0041]In one embodiment, the disclosure relates to a method and apparatus for depositing a film in substantially solid form on a substrate. Such films can be used, for example, in the design and construction of OLEDs and large area transistor circuits. In one embodiment, the disclosure relates to a method and apparatus for depositing a film of material in substantially solid form on a substrate. In another embodiment, the disclosure relates to a method and apparatus for depositing a film of material substantially free of solvent of a substrate. Such films can be used, for example, in the design and construction of OLEDs and large area transistor circuits. The materials that may be deposited by the apparatuses and methods described herein include organic materials, metal materials, and inorganic semiconductors and insulators, such as inorganic oxides, chalcogenides, Group IV semiconductors, Group III-V compound semiconductors, and Group II-VI semiconductors.
[0042]FIG. 1A is a schemat...
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