Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device

a positioning device and dynamic isolation technology, applied in the field of precision motion stages, can solve problems such as reducing the frequency response of the stage, and achieve the effect of reducing unwanted moments of force (i.e., torque)

Inactive Publication Date: 2008-07-31
NIKON CORP
View PDF1 Cites 99 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This solution enhances the precision and frequency response of the stage by eliminating guide-induced vibrations, maintaining accuracy, and preventing unwanted motion in the projection lens system, allowing for faster positioning and reduced assembly complexity.

Problems solved by technology

Additionally, many prior art stages do not drive the stage through its center of gravity which undesirably induces a twisting motion in the stage, reducing the frequency response of the stage.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
  • Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
  • Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037]FIG. 1 shows a top view of a stage mechanism in accordance with the invention. See also commonly owned and invented U.S. patent application, Ser. No. 08 / 221,375 filed Apr. 1, 1994, which is incorporated herein by reference and shows a related method of supporting elements of a stage mechanism so as to isolate reaction forces from the projection lens and other parts of a photolithography apparatus.

[0038]The detailed description from U.S. patent application Ser. No. 08 / 221,375 is reproduced below. FIGS. 1-11 of that application have been renumbered respectively as FIGS. 7-17, and the reference numerals have been increased by 200 in order to avoid the use of duplicate reference numerals for different elements.

[0039]While it will be appreciated by those skilled in the art that the guideless stage, with or without its isolating reaction frame, has many applications to many different types of instruments for precise positioning of objects, the invention will be described with respec...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A positioning device includes an object table, a sub-system for processing an object to be placed on the object table, a drive unit for displacing the object table relative to the sub-system, and a measuring system for measuring a position of the object table relative to the sub-system. The drive unit includes a stationary part which is fastened to a first frame of the positioning device, while the measuring system includes a stationary part and a movable part which is fastened to the object table for cooperation with the stationary part of the measuring system. The stationary part of the measuring system is fastened to a second frame of the positioning device which is dynamically isolated from the first frame.

Description

[0001]This is a Division of application Ser. No. 09 / 449,763 filed Nov. 26, 1999, which in turn is a Continuation of application Ser. No. 09 / 192,153 filed Nov. 12, 1998 (now U.S. Pat. No. 6,246,202), which is a Continuation of application Ser. No. 08 / 416,558 filed Apr. 4, 1995 (now U.S. Pat. No. 5,874,820). Said application Ser. No. 09 / 449,763 also is a Continuation-In-Part of application Ser. No. 09 / 127,288 filed Jul. 31, 1998 (now U.S. Pat. No. 6,049,186), which is a Continuation of application Ser. No. 08 / 627,824 filed Apr. 2, 1996 (now U.S. Pat. No. 5,942,871), which is a Continuation of application Ser. No. 08 / 221,375 filed Apr. 1, 1994 (now U.S. Pat. No. 5,528,118). The entire disclosures of the above-identified prior applications are hereby-incorporated by reference herein in their entireties.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]This invention relates to precision motion stages and more specifically to a stage suitable for use in a photolithography m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): G03B27/58
CPCG03F7/70716G03F7/70833G03F7/70775
Inventor LEE, MARTIN E.
Owner NIKON CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com