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Polyurethane Urea Polishing Pad with Window

a technology of polyurethane urea and polishing pad, applied in the field of articles, can solve problems such as containing certain errors

Inactive Publication Date: 2007-01-25
PPG IND OHIO INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Any numerical value, however, inherently contain certain errors necessarily resulting from the standard deviation found in their respective testing measurements.

Method used

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  • Polyurethane Urea Polishing Pad with Window
  • Polyurethane Urea Polishing Pad with Window
  • Polyurethane Urea Polishing Pad with Window

Examples

Experimental program
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Effect test

example 1

[0155] 36.00 kilograms of Airthane PHP-75D polyurethane prepolymer, 1.26 kilograms of Desmodur N 3300A and 0.19 kilograms of Niax L-1800 surfactant were charged into the first tank of a Baule′ three-component low pressure dispensing machine and held at 140° F. with 15 PSI of nitrogen pressure. This tank was mixed with low agitation. A curative mixture was prepared by melting 35.5 kilograms of Lonzacure MCDEA at a temperature of 210° F. then 5.5 kilograms of Versalink P-250 were added with stirring. Next, 0.21 kilograms of Niax L1800 added and stirred until uniformly mixed. This curative mixture was then charged into the second tank and held at 210° F. with 40 psi of nitrogen pressure and mixed with low agitation. Then a mixture of 219 grams Versalink P-650, 60 grams of DABCO BL-19 catalyst and 21 grams of deionized water were charged into the third tank at ambient temperature and pressure. The fluids of the first, second and third tanks were fed into a mixer, by constant delivery pu...

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Abstract

The present invention relates to an article for altering a surface of a work piece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and / or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.

Description

RELATED APPLICATIONS [0001] This application is a continuation of pending U.S. patent application Ser. No. 10 / 974,517 filed on Oct. 27, 2004 entitled “Polyurethane Urea Polishing Pad” which published Apr. 27, 2006 as publication number 2006-0089094 that is incorporated herein by reference.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to an article for altering a surface of a work piece. In particular, the present invention is directed to a polishing pad having a window. More particularly, the polishing layer of the pad can include a polyurethane urea material wherein cells at least partially filled with gas are substantially uniformly distributed throughout at least a portion of the material and / or pad. The polyurethane urea material can be prepared by combining polyisocyanate and / or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present inventi...

Claims

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Application Information

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IPC IPC(8): B24D11/00
CPCB24B37/205B32B2475/00B32B3/18B32B5/18B32B5/20B32B27/065B32B27/36B32B2264/102B32B2266/0278B32B2266/08B32B2307/412B32B2307/554B32B2432/00B32B2457/14B24D3/32
Inventor SWISHER, ROBERT G.WANG, ALAN E.ALLISON, WILLIAM C.
Owner PPG IND OHIO INC
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