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Microelectrode array for chronic deep-brain microstimulation for recording

a microelectrode array and deep-brain microstimulation technology, applied in the field of deep-brain microelectrode array for implantation in deep-brain nuclei, can solve the problems of too large number of electrode sites required to span and populate the human stn or gpi, and the mechanism of action is not fully understood

Inactive Publication Date: 2006-12-07
HUNTINGTON MEDICAL RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While the range of clinical applications for DBS has expanded in recent years, its mechanism of action is not completely understood.
The number of electrodes sites required to span and populate the human STN or Gpi is too large to be realized using discrete microelectrodes, necessitating the use of multisite silicon probes.

Method used

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  • Microelectrode array for chronic deep-brain microstimulation for recording
  • Microelectrode array for chronic deep-brain microstimulation for recording
  • Microelectrode array for chronic deep-brain microstimulation for recording

Examples

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Embodiment Construction

[0021]FIGS. 1-3 illustrate a multielectrode silicon-substrate probe 10 according to the invention. The silicon substrate is preferably formed by deep reactive-ion etching which can yield a relatively strong and rigid structure of up to at least 0.1 mm in thickness. The body of probe 10 has an enlarged upper end 11 with a width of about 0.8 mm, a height of about 2 mm, and a thickness of about 0.1 mm. The upper end is a bonding pad with multiple (presently ten) conductive portions 12, preferably gold, to which conducting lead wires (not shown) are attached. After the leads are attached, the upper end is coated with a silicon elastomer.

[0022] Extending downwardly from the probe upper end is an elongated shank 13, about 10 mm in length. The shank has an upper-end width of about 0.4 mm, and tapers to a rounded tip 14. Commencing about 3 mm below upper end 11, there are ten stimulating-or-recording electrode sites 15 or 16 which are vertically spaced apart about 0.8 mm. These sites span ...

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Abstract

The invention relates to a multielectrode probe having a silicon substrate which supports multiple conductive electrodes for deep-brain electrical stimulation or recording of neural responses. The substrate has an upper end with multiple conductive portions for bonding to lead wires, and an elongated shank extends from the upper end. The shank supports multiple spaced-apart electrodes, typically ten in number, and conductive traces electrically connect the electrodes and conductive traces. Multiple probes are combined, and supported as an array by a cylindrical alignment cylinder.

Description

CROSS REFERENCE TO RELATED APPLICATION [0001] This application is in part based on, and claims the filing date of U.S. Provisional Application 60 / 687,197 filed Jun. 2, 2005.BACKGROUND OF THE INVENTION [0002] This invention relates to a microelectrode array for implantation in deep-brain nuclei such as the subthalamic nucleus and the internal segment of the globus pallidus. [0003] Electrical stimulation in deep brain structures (deep brain stimulation, or “DBS”) has developed into an effective treatment modality for advanced Parkinson's Disease and essential tremor. DBS also is being evaluated as a treatment for other neurological conditions and appears to be useful in the treatment of several types of dystonias and hyperkinetic disorders. While the range of clinical applications for DBS has expanded in recent years, its mechanism of action is not completely understood. Studies directed towards an elucidation of the physiologic underpinnings of DBS certainly have been aided by a prev...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): A61N1/05
CPCA61N1/0534A61N1/05A61B5/685
Inventor MCCREERY, DOUGLAS B.
Owner HUNTINGTON MEDICAL RES INST
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