Electroplating in presence of co2
A CO2, CH2 technology, applied in the field of environmental response, can solve the problem that there is no information related to the surfactant and the coating operation of the coating
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Embodiment 1
[0237] figure 1 is the device used in the examples of the present invention.
[0238] Add 20cc nickel plating bath (Watt bath: nickel sulfate 280g / L, nickel chloride 60g / L, boric acid 50g / L, amount of gloss agent) in the high pressure container 8 of 50cc in internal volume, relative plating bath is 0.3wt% F(CF(CF 3 ) CF 2 O) 3 CF(CF 3 )COO(CH 2 CH 2 O) 2 CH 3 , mounted and sealed a degreased brass plate on the cathode, and a pure nickel plate (each with a surface area of 4 cm) on the anode and sealed 2 ), after heating up to 50°C in the constant temperature tank 4, use the infusion pump 3 and the pressure regulator 10 to seal the CO 2 Up to 10MPa. By using the stirrer 5 to rotate the rotor 6 at 500r.p.m, the CO 2 - Plating solution, then at 5A / dm 2 Electricity was applied for 6 minutes to perform nickel plating. After the energization was completed, the pressure was reduced, and then the cathode plate was taken out, sufficiently washed with water, and the surfac...
Embodiment 2
[0240] as having CO 2 For non-ionic compounds with affinity moieties use H(CF 2 ) 6 COOCH 2 CH 3 , except that, plating was performed by the same method as in Example 1.
[0241] The obtained scanning electron micrographs are shown in image 3 middle.
Embodiment 3
[0243] as having CO 2 Non-ionic compounds with affinity part use F(CF 2 ) 6 (CH 2 ) 10 H, plating was performed by the same method as Example 1 except that.
[0244] The obtained scanning electron micrographs are shown in Figure 4 middle.
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