210-400 um superthick electrolytic copper foil, its composite process and apparatus
A technology of electrolytic copper foil and composite process, applied in electrolytic process, electroforming and other directions, can solve the problems of inability to form, the roughness of super thick copper foil is difficult to control, etc.
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Embodiment example 1
[0018] The process parameters for producing 210μm ultra-thick electrolytic copper foil are:
[0019] 1) Current A is 30KA;
[0020] 2) The rotation speed of cathode roller is 0.17m / min;
[0021] 3) The flow rate of copper sulfate solution is 50m 3 / h;
[0022] 4) The temperature of the copper sulfate solution is 55°C±2;
[0023] 5) Adopt traditional production <210μm electrolytic copper foil addition process;
[0024] 6) The speed of the polishing roller is 350 rpm;
[0025] 7) The grinding wheel grain size of the polishing roller is 600 # ;
[0026] 8) The swing frequency of the polishing roller is 200 times / min;
[0027] 9) The swing of the polishing roller is 1cm.
[0028] The roughness Ra of the rough surface of the copper foil was detected to be 9.8 μm.
Embodiment example 2
[0030] The process parameters for producing 400μm ultra-thick electrolytic copper foil are:
[0031] 1) Current A is 25KA;
[0032] 2) The rotation speed of cathode roller is 0.09m / min;
[0033] 3) The flow rate of copper sulfate solution is 70m 3 / h;
[0034] 4) The temperature of the copper sulfate solution is 55°C±2;
[0035] 5) Adopt traditional production <210μm electrolytic copper foil addition process;
[0036] 6) The speed of the polishing roller is 600 rpm;
[0037] 7) The grinding wheel grain size of the polishing roller is 600 # ;
[0038] 8) The swing frequency of the polishing roller is 200 times / min;
[0039] 9) The swing of the polishing roller is 1cm.
[0040] The roughness Ra of the rough surface of the copper foil was detected to be 12.8 μm.
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