Composite process for producing 210-400 mum superthick electrolytic copper foil, and apparatus thereof
A technology of electrolytic copper foil and composite process, applied in electrolytic process, electroforming and other directions, can solve the problems of difficult to control roughness of ultra-thick copper foil and inability to form
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Embodiment example 1
[0018] The process parameters for producing 210μm ultra-thick electrolytic copper foil are:
[0019] 1) Current A is 30KA;
[0020] 2) The rotation speed of cathode roller is 0.17m / min;
[0021] 3) The flow rate of copper sulfate solution is 50m 3 / h;
[0022] 4) The temperature of the copper sulfate solution is 55°C±2;
[0023] 5) Adopt traditional production <210μm electrolytic copper foil addition process;
[0024] 6) The speed of the polishing roller is 350 rpm;
[0025] 7) The grinding wheel grain size of the polishing roller is 600 # ;
[0026] 8) The swing frequency of the polishing roller is 200 times / min;
[0027] 9) The swing of the polishing roller is 1cm.
[0028] The roughness Ra of the rough surface of the copper foil was detected to be 9.8 μm.
Embodiment example 2
[0030] The process parameters for producing 400μm ultra-thick electrolytic copper foil are:
[0031] 1) Current A is 25KA;
[0032] 2) The rotation speed of cathode roller is 0.09m / min;
[0033] 3) The flow rate of copper sulfate solution is 70m 3 / h;
[0034] 4) The temperature of the copper sulfate solution is 55°C±2;
[0035] 5) Adopt traditional production <210μm electrolytic copper foil addition process;
[0036] 6) The speed of the polishing roller is 600 rpm;
[0037] 7) The grinding wheel grain size of the polishing roller is 600 # ;
[0038] 8) The swing frequency of the polishing roller is 200 times / min;
[0039] 9) The swing of the polishing roller is 1cm.
[0040] The roughness Ra of the rough surface of the copper foil was detected to be 12.8 μm.
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