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Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data

A technology of drawing data and data generation, which is applied in the direction of electrical digital data processing, special data processing applications, and original parts for optical mechanical processing, etc., and can solve problems such as difficulty in realizing design change automation and increasing design time

Inactive Publication Date: 2006-06-14
DAINIPPON SCREEN MTG CO LTD
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Problems solved by technology

[0007] When making a new pattern design, changing a design, or correcting a design according to the characteristics of manufacturing equipment, not only the long time required to obtain information on the design but also the possible time required for repeated trial and error will increase the design time accordingly, making it difficult Realization of automation in processing such as design changes

Method used

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  • Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data
  • Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data
  • Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data

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Embodiment Construction

[0043]FIG. 1 is a block diagram showing a data generating system 1 for generating cartographic data according to a first preferred embodiment of the present invention. Drawing data are used to form geometric patterns on any of printed circuit boards, semiconductor substrates, flat-panel displays such as plasma displays or liquid crystal displays, photomask glass substrates (hereinafter referred to as "substrates") when manufacturing these substrates. pattern.

[0044] The data generating system 1 has a structure in which a basic pattern generating device 21 and a server 22 are provided in and managed by a design department 2 for designing a pattern; a drawing data generating device 31 is provided in a part of a manufacturing department and used for drawing These constituent units are all connected to the communication network 9 in and managed by the drawing department 3 of the company. Although the basic pattern generating device 21 and the drawing data generating device 31 a...

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PUM

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Abstract

PROBLEM TO BE SOLVED: To improve design efficiency of a pattern by individually defining a basic pattern and a correction rule on pattern formation, in pattern forming data to be used on forming a geometric pattern on a substrate. ŽSOLUTION: A data generating apparatus converts a description format of basic pattern CAD data into XML to generate pattern formation data 91, adds a rule addition index 912 representing pattern formation conditions and an object pattern element to the pattern formation data 91, and further adds a correction rule as a correction rule part 913 acquired from a database, based on the rule addition index 912. Since the pattern formation data 91 include a basic pattern part 911 and the correction rule part 913, the basic pattern and the correction rule on pattern formation are defined individually, which easily improves design efficiency of a pattern. ŽCOPYRIGHT: (C)2006,JPO&NCIPI Ž

Description

technical field [0001] The present invention relates to a data generation system for generating drawing data, a drawing data generating device, a method for generating drawing data, and a storage medium carrying drawing data for use in manufacturing printed circuit boards, semiconductor substrates, flat-panel displays A geometric pattern is formed on a substrate during a process such as Background technique [0002] Geometry is recorded as a photosensitive material formed on a printed circuit board, a semiconductor substrate, a flat panel display such as a plasma display or a liquid crystal display, a photomask glass substrate, etc. (hereinafter referred to as "substrate") by irradiating light to As a patterning method, a method for transferring a mask pattern to a photosensitive material, and a method for directly recording a pattern by scanning and irradiating a modulated light beam on a photosensitive material are known. [0003] For example, in the case of a TFT (Thin F...

Claims

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Application Information

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IPC IPC(8): G06F17/50G03F1/68H01L21/027
Inventor 中村宪彦岸田吉弘
Owner DAINIPPON SCREEN MTG CO LTD
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