Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Light shield and method for making inclined reflection bumpers by using the same

The technology of a bump and a mask is applied in the field of oblique reflection bumps, which can solve the problem of low optical effect of the inclined reflection bump in a reflective liquid crystal display device, and achieve the effects of good reflection effect, good viewing angle uniformity and wide viewing angle.

Inactive Publication Date: 2005-12-07
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
View PDF1 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] In order to overcome the defect that the optical effect of the inclined reflective protrusion in the reflective liquid crystal display device produced by the photomask of the prior art is not high, the present invention provides a kind of oblique reflective protrusion in the reflective liquid crystal display device that can produce a higher optical effect mask
[0013] In order to overcome the defect that the optical effect of the oblique reflective protrusion in the reflective liquid crystal display device produced by the photomask of the prior art is not high, the present invention provides another kind of oblique reflective protrusion in the reflective liquid crystal display device with a higher optical effect. block mask
[0014] In order to overcome the defect that the optical effect of the oblique reflective protrusion in the reflective liquid crystal display device produced by the photomask in the prior art is not high, the present invention provides another kind of oblique reflective protrusion in the reflective liquid crystal display device with a higher optical effect. block mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light shield and method for making inclined reflection bumpers by using the same
  • Light shield and method for making inclined reflection bumpers by using the same
  • Light shield and method for making inclined reflection bumpers by using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] see Figure 8 , is a schematic plan view of a photomask used to make inclined reflective bumps according to the present invention. In this figure, the photomask 100 has three independent photomask patterns 110, 120, and 130 of different sizes, and each pattern consists of a light-transmitting part Combined with the shading part. Taking the mask pattern 110 as an example for illustration, the mask pattern 110 is roughly rectangular and formed by merging the light-transmitting portion 113 and the light-shielding portion 111 . The light-shielding portion 111 is basically a rectangular block-shaped area, one side of which is connected to the light-transmitting portion 113 has a plurality of rectangular protrusions 112 in the plane direction of the mask, while the other three sides are flat.

[0041] The plurality of rectangular protrusions 112 have a width of 1-3 μm and a length of 0-5 μm. In this embodiment, the width s is 1 μm, and the length h and the interval d are equ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
lengthaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

This invention discloses a blend used in producing tilted reflection projectors including multiple patterns bridged by penetration parts and shading parts, among which, said penetration part or the shading part is block zone, one side of the block zone has many projectors on the blend plane direction. The processing method is also disclosed.

Description

【Technical field】 [0001] The invention relates to a photomask (Photo Mask) and a method for making an inclined reflective bump (Bump) using the photomask, in particular to a photomask for making reflective or transflective (Transflective) A photomask used in liquid crystal display devices (Liquid Crystal Display Devices, LCD Devices) and a method for using the photomask to manufacture inclined reflective protrusions in reflective liquid crystal display devices. 【Background technique】 [0002] Liquid crystal display devices have the advantages of lightness, thinness, low power consumption, and digitization, and are currently more and more widely used in the market. Liquid crystal display devices can be classified into transmissive, reflective and transflective according to their light source utilization methods. For reflective or transflective liquid crystal display devices, both brightness and viewing angle must be considered. Reflective or semi-transmissive semi-reflectiv...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 赖建延彭家鹏陈永昌
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products