Process for synthesizing mesoporous silicon oxide molecular sieve material by ultrasonic system
A technology of mesoporous silica and synthesis method, applied in chemical instruments and methods, molecular sieves and alkali exchange compounds, inorganic chemistry, etc., can solve the problems of poor emulsifying and dispersing ability of oily substances, poor dispersing ability and difficult synthesis, etc. The effect of improved performance, high synthesis efficiency, and reduced synthesis difficulty
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0018] Embodiment 1, 0.5 gram of Pluronic F108 (EO 132 PO 50 EO 132 ) was dissolved in 30 grams of 2M hydrochloric acid aqueous solution, and after the surfactant was dissolved, 2.08 grams of TEOS was added to the solution. The solution is immediately placed in an ultrasonic tank (with a constant temperature water tank), ultrasonicated at 40°C for 2 to 4 hours, and a three-dimensional highly ordered organic-inorganic composite material is formed through the chemical process of sol and gel and the process of cooperative self-assembly. After the three-dimensional material is hydrothermally aged at 100°C for 12 hours, it is finally calcined at 550°C for 5 hours to remove the surfactant. Analysis tests such as PXRD, BET and TEM prove that the film material is a silicon oxide material with a high-quality three-dimensional cubic structure (space group is Im-3m). The specific surface area of the material is 620m 2 / g, the pore volume is 0.9cm 3 / g, the pore size is 5.2 nm.
Embodiment 2
[0019] Embodiment 2, 0.8 gram of Pluronic P103 (EO 17 PO 56 EO 17 ) was dissolved in 30 grams of 2M hydrochloric acid aqueous solution, and after the surfactant was dissolved, 2.08 grams of TEOS was added to the solution. The solution is immediately placed in an ultrasonic tank (with a constant temperature water tank), and ultrasonicated at 40°C for 2 to 4 hours. After the chemical process of sol and gel and the process of cooperative self-assembly, a two-dimensional highly ordered organic-inorganic composite material is formed. The two-dimensional material was hydrothermally aged at 100° C. for 12 hours, and finally calcined at 550° C. for 5 hours to remove the surfactant. Analysis tests such as PXRD, BET and TEM prove that the film material is a high-quality two-dimensional hexagonal silicon oxide material. The specific surface area of the material is 720m 2 / g, the pore volume is 1.1cm 3 / g, the pore size is 6.7 nm.
Embodiment 3
[0020] Embodiment 3, 0.9 gram of Pluronic P103 (EO 17 PO 56 EO 17 ) was dissolved in 35 grams of 2M hydrochloric acid aqueous solution, and after the surfactant was dissolved, 2.08 grams of TEOS was added to the solution. The solution is immediately placed in an ultrasonic tank (with a constant temperature water tank), ultrasonicated at 45°C for 2 to 4 hours, and a two-dimensional highly ordered organic-inorganic composite material is formed through the sol-gel chemical process and the cooperative self-assembly process. The two-dimensional material was hydrothermally aged at 100° C. for 12 hours, and finally calcined at 550° C. for 5 hours to remove the surfactant. Analysis tests such as PXRD, BET and TEM prove that the film material is a high-quality silicon oxide material with a two-dimensional hexagonal structure (space group p6mm). The specific surface area of the material is 730m 2 / g, the pore volume is 1.0cm 3 / g, the pore size is 6.6 nm.
PUM
Property | Measurement | Unit |
---|---|---|
Specific surface area | aaaaa | aaaaa |
Pore volume | aaaaa | aaaaa |
Specific surface area | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com