Operation method of fast erasable and rewritable memory with symmetrical double-channel
A write memory, dual-channel technology, applied in the field of flash memory with symmetrical dual-channel operation, can solve the problems of high read voltage, low read current, slow read speed, etc.
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[0045] The present invention describes in detail the operation method of a flash memory with symmetrical dual channels, using a flash memory with symmetrical dual channels, such as silicon nitride memory (NROM), by simultaneously outputting the read current of dual channels to The reading speed of the data signal is increased, and a lower reading voltage is further used, corresponding to an optimized reading current, to increase the reading times of the memory and prolong the service life of the flash memory.
[0046]Refer to FIGS. 2A-2B , which illustrate a top view and a cross-sectional view of a partial area of the flash memory of the present invention. Form ONO layer 202 on substrate 200, wherein ONO layer 202 is made up of first oxide layer 202a, silicon nitride layer 202b and second oxide layer 202c, and first oxide layer 202a is between 50 to 90 Angstroms, nitrogen The silicon oxide layer 202b is between 30-70 angstroms, and the second oxide layer 202c is between 60-1...
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