Supporting plate, mask plate and preparation method of mask plate

Abstract

The embodiment of the invention discloses a supporting plate, a mask plate and a preparation method of the mask plate. In one specific implementation mode, the supporting plate for the mask plate comprises a plate body, wherein the plate body comprises a first surface, a second surface and a side wall connected with the first surface and the second surface; and the plate body further comprises at least one hollow area penetrating through the first surface and the second surface. The supporting plate further comprises a protruding part formed by protruding outwards from the side wall of the plate body, and the protruding part is used for being fixedly connected with a frame of the mask plate; and the thickness of the protruding part is less than that of the plate body. The supporting plate is directly connected and fixed with the frame of the mask plate by arranging the protruding part, a traditional stretching assembly process for a single metal mask layer is replaced, a net stretching process is greatly simplified, and therefore the bad conditions that the metal mask layer is prone to deformation, wrinkles or damage and the like in the stretching process in the prior art are prevented.

Description

technical field [0001] The invention relates to the field of display technology. More specifically, it relates to a support plate, a mask plate and a preparation method thereof. Background technique [0002] The organic light-emitting materials in OLED display panel devices are usually prepared by vacuum evaporation process, such as using the evaporation process of precision metal mask to prepare high-resolution RGB pixel graphics in the display panel, and the precision metal mask. The precise hole pattern ensures the precise and controllable evaporation of the organic light-emitting material onto the display panel. [0003] At present, mass production in the display industry generally adopts a fine metal mask layer (FMM, Fine Metal Mask) of Invar material produced by a wet etching process, and the thickness of the fine metal mask layer is usually 25-40 μm. Limited by the traditional wet etching process, the realized display limit is 600-700PPI, and the preparation of a me...

AI Technical Summary

Problems solved by technology

Due to the high precision requirements, complex process, and high time cost of the stretching process, and the metal mask strips are prone to deformation or damage during the stretching process, the yield rate of the metal mask is low.

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