Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Structure isogeometric topological optimization method considering meso-nano scale effect

A topology optimization and scale effect technology, applied in geometric CAD, design optimization/simulation, special data processing applications, etc., can solve problems such as insufficient accurate description and prediction of mechanical properties, lack of microstructure information, etc., to reduce design time. , Improve the calculation accuracy and avoid the effect of errors

Active Publication Date: 2021-09-24
XI AN JIAOTONG UNIV
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the lack of microstructural information, classical continuum theory is insufficient to accurately describe and predict the mechanical properties of these materials and structures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Structure isogeometric topological optimization method considering meso-nano scale effect
  • Structure isogeometric topological optimization method considering meso-nano scale effect
  • Structure isogeometric topological optimization method considering meso-nano scale effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0087] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments. The method of the present invention can be used in the structural design of various micro-components. The embodiment takes the structural design of a classic simple cantilever beam under the existence of scale effect as an example.

[0088] refer to figure 1 , a structural isogeometric topology optimization method considering mesonic scale effects, including the following steps:

[0089] 1) Establish a mesoscopic structural optimization model:

[0090] For the mechanical problems of simple cantilever beams under the scale effect, the relative density of the element ρ is used as the design variable, the best load-bearing performance is the optimization goal, and the structural flexibility is set as the objective function; the amount of optimized structural materials must not exceed the allowable amount of materials , the force balance control equation, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a structure isogeometric topological optimization method considering a meso-nano scale effect. The method is based on a strain gradient mechanical theory, adopts an isogeometric analysis method, constructs a geometric model and an analysis model by using a non-uniform rational B spline (NURBS), and constructs a geometric analysis calculation tool by nesting a strain gradient theory by using an NURBS primary function with a preset order; and a topological optimization method based on variable density method structure description is adopted, and topological optimization design is carried out with the unit density as a design variable. According to the method, the mechanical behaviors of the meso-nano micro-component are accurately described, structural response calculation and sensitivity analysis are reliably realized, an accurate topological optimization structure is obtained, and meanwhile, the problems of low solving precision, large calculation amount, long consumed time and the like of micro-component topological optimization design can be solved.

Description

technical field [0001] The invention belongs to the technical field of structural design of micro-components, and specifically designs a geometric topology optimization method such as a structure that considers mesoscopic scale effects. Background technique [0002] In the micro-size range, micromachines can be divided into micromachines (1mm-10mm), micromachines (1μm-1mm) and nanomachines (1nm-1μm) according to their size characteristics. In micro-electro-mechanical systems, the working principles of micro-electro-mechanical products are mostly based on the movement or deformation of micro-components. According to the characteristic dimensions and deformation characteristics of the main components in micro-electro-mechanical systems, it can be simplified as micro-beams and micro-rods. , microplate and microfilm mechanical models. [0003] At present, most researches on topology optimization of micro-components rely on the classical continuum mechanics theory, which is base...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F30/10G06F30/20G06F111/04G06F119/14
CPCG06F30/10G06F30/20G06F2119/14G06F2111/04
Inventor 李宝童段瑜琪巴佳豪刘宏磊洪军
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com