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A multi-level two-way evolution structure optimization method for materials

An optimization method and multi-level technology, applied in multi-objective optimization, computer material science, design optimization/simulation, etc., can solve problems such as falling into local optimal solutions, and achieve the effect of low compliance and high material utilization

Active Publication Date: 2021-11-05
HUNAN UNIV OF SCI & TECH
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AI Technical Summary

Problems solved by technology

The classic BESO algorithm adopts a 0-1 optimization method, which may fall into a local optimal solution due to boundary problems in the optimization process

Method used

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  • A multi-level two-way evolution structure optimization method for materials
  • A multi-level two-way evolution structure optimization method for materials
  • A multi-level two-way evolution structure optimization method for materials

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Embodiment 1

[0057] A method for optimizing a multi-level bidirectional evolution structure of a material, specifically comprising the following steps:

[0058] S1: discretize the entire design domain using a finite element mesh;

[0059] S2: Define the initial parameters, including the target volume ratio V obj , the average adjustment coefficient α of materials at all levels j , upgrade rate e r and downgrade rate r r , material scale number n and elastic modulus physical parameters of each material;

[0060] S3: Perform finite element analysis;

[0061] S4: Calculate the sensitivity of all units;

[0062] S5: Filter and update sensitivity:

[0063] S6: Calculate the upgrade index P of each material j,1 and the degradation index P j,2 ;

[0064] S7: Carry out de-escalation operation between adjacent material grades;

[0065] S8: Judging whether the target volume ratio V is reached obj , if yes, the optimization ends, otherwise return to S3.

[0066] As a further improvement o...

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Abstract

The present invention relates to a material multi-level bidirectional evolution structure optimization method, which specifically includes the following steps: S1: using finite element grids to discretize the entire design domain; S2: defining initial parameters, including the target volume ratio V obj , the average adjustment coefficient α of materials at all levels j , upgrade rate e r and downgrade rate r r , material scale number n and physical parameters of elastic modulus of each material; S3: Perform finite element analysis; S4: Calculate unit sensitivity; S5: Sensitivity filtering and updating: S6: Calculate the upgrade index P of each material j,1 and the degradation index P j,2 ; S7: Carry out upgrading and upgrading operations between adjacent material grades; S8: Determine whether the target volume ratio V is reached obj , if yes, the optimization ends, otherwise return to S3. The invention can obtain a better solution than the classic BESO, and the solution has lower flexibility and is more in line with the optimization goal; the evolved bar system structure topology is clearer as a whole and the material utilization rate is higher.

Description

technical field [0001] The invention relates to a material multi-level two-way evolution structure optimization method. Background technique [0002] The BESO series algorithm is one of the most commonly used and most stable topology optimization algorithms when looking for the optimal topological shape of a structure to guide design in current engineering. The classic BESO algorithm adopts a 0-1 optimization method, which may fall into a local optimal solution due to boundary problems in the optimization process. Contents of the invention [0003] The purpose of the present invention is to provide a material multi-level two-way evolution structure optimization method, which can obtain a better solution than the classic BESO. On the one hand, the solution has lower compliance and is more in line with the optimization goal; The topological overall member is clearer, the material utilization rate is higher, and the stress mechanism of the member is further reflected through...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G16C60/00G16C10/00G06F30/23G06F111/06G06F119/14
CPCG16C10/00G16C60/00G06F30/23G06F2111/06G06F2119/14
Inventor 张鹄志罗鹏黄垚森马哲霖
Owner HUNAN UNIV OF SCI & TECH
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