Array type rectangular cavity microwave plasma generator

A microwave plasma, rectangular cavity technology, applied in the microwave field, can solve the problems of less plasma volume, poor uniformity, insufficient stability, etc., and achieve uniform field intensity distribution, microwave power adjustment, gas flow rate adjustment, good uniformity and stability. Effect

Active Publication Date: 2021-06-04
成都奋羽电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The object of the present invention is to provide an array type rectangular cavity microwave plasma generator for the above disadvantages, and intends to solve the problems of less plasma generated by existing microwave plasma generators, poor uniformity, and insufficient stability.

Method used

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  • Array type rectangular cavity microwave plasma generator
  • Array type rectangular cavity microwave plasma generator
  • Array type rectangular cavity microwave plasma generator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] See attached Figure 1~4 . The arrayed rectangular cavity microwave plasma generator includes a rectangular cavity housing 1, a first radiation line group 2 and a second radiation line group 3; the first radiation line group 2 and the second radiation line group 3 are arranged in the rectangular cavity housing 1 Inside; the first radiating line group 2 and the second radiating line group 3 both include several radiating lines; the radiating line of the first radiating line group 2 is from the left side wall of the rectangular cavity shell 1 to the rectangular cavity shell 1 The right side wall extends; the radiation of the second radiation group 3 extends from the right side wall of the rectangular cavity housing 1 to the left side wall of the rectangular cavity housing 1; the radiation of the first radiation group 2 and the second The radiation lines of radiation group 3 cross sequentially. It can be seen from the above structure that the inner cavity of the rectangu...

Embodiment 2

[0025] See attached Figure 1~4 . The arrayed rectangular cavity microwave plasma generator includes a rectangular cavity housing 1, a first radiation line group 2 and a second radiation line group 3; the first radiation line group 2 and the second radiation line group 3 are arranged in the rectangular cavity housing 1 Inside; the first radiating line group 2 and the second radiating line group 3 both include several radiating lines; the radiating line of the first radiating line group 2 is from the left side wall of the rectangular cavity shell 1 to the rectangular cavity shell 1 The right side wall extends; the radiation of the second radiation group 3 extends from the right side wall of the rectangular cavity housing 1 to the left side wall of the rectangular cavity housing 1; the radiation of the first radiation group 2 and the second The radiation lines of radiation group 3 cross sequentially. It can be seen from the above structure that the inner cavity of the rectangu...

Embodiment 3

[0028] See attached Figure 1~4 . The arrayed rectangular cavity microwave plasma generator includes a rectangular cavity housing 1, a first radiation line group 2 and a second radiation line group 3; the first radiation line group 2 and the second radiation line group 3 are arranged in the rectangular cavity housing 1 Inside; the first radiating line group 2 and the second radiating line group 3 both include several radiating lines; the radiating line of the first radiating line group 2 is from the left side wall of the rectangular cavity shell 1 to the rectangular cavity shell 1 The right side wall extends; the radiation of the second radiation group 3 extends from the right side wall of the rectangular cavity housing 1 to the left side wall of the rectangular cavity housing 1; the radiation of the first radiation group 2 and the second The radiation lines of radiation group 3 cross sequentially. It can be seen from the above structure that the inner cavity of the rectangu...

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Abstract

The invention discloses an array type rectangular cavity microwave plasma generator, and belongs to the technical field of microwaves. A first radiation line group and a second radiation line group are arranged in a rectangular cavity shell; each of the first radiation line group and the second radiation line group comprises a plurality of radiation lines; radiation rays of the first radiation ray group extend from the left side wall of the rectangular cavity shell to the right side wall of the rectangular cavity shell; radiation rays of the second radiation ray group extend from the right side wall of the rectangular cavity shell to the left side wall of the rectangular cavity shell; the radiation rays of the first radiation ray group and the radiation rays of the second radiation ray group intersect in sequence. The array type rectangular cavity microwave plasma generator is uniform in field intensity distribution in the cavity and uniform in airflow flowing, has the functions of temperature monitoring, microwave power adjustment and gas flow rate adjustment in good time and radiation ray protection, can generate plasmas in a large area, and is high in efficiency, good in uniformity and stability and high in reliability. And the internal discharge condition can be observed conveniently.

Description

technical field [0001] The invention belongs to the field of microwave technology, in particular to an array type rectangular cavity microwave plasma generator. Background technique [0002] The principle of existing microwave plasma generating devices is to excite process gas into plasma by means of high-frequency oscillating electromagnetic waves. A plasma source with high density, good uniformity and strong stability is often required in industrial production. The existing microwave plasma generating device produces a small amount of plasma, poor uniformity, and insufficient stability. It has been unable to meet the requirements of industrial production in the fields of thin film material deposition and surface treatment. Contents of the invention [0003] The object of the present invention is to provide an array type rectangular cavity microwave plasma generator aiming at the above disadvantages, and intends to solve the problems of less plasma, poor uniformity and i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46H05H1/04C23C16/511
CPCH05H1/46H05H1/04C23C16/511
Inventor 吉皓
Owner 成都奋羽电子科技有限公司
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