Low-temperature plasma processing device capable of realizing on-line self-cleaning and use method thereof

Abstract

The invention discloses a low-temperature plasma processing device capable of realizing on-line self-cleaning and a use method thereof. The low-temperature plasma processing device comprises a sealable box body, a rotating shaft transversely penetrates through the sealable box body, a positive electrode fixing disc and a negative electrode fixing disc are rotatably connected to the rotating shaft, N layers of discharge tubes are arranged between the positive electrode fixing disc and the negative electrode fixing disc in a penetrating manner, each layer of discharge tubes are formed by uniformly distributing a plurality of discharge tubes of the same type at 360 degrees by taking the rotating shaft as the center, and the electric properties of the two adjacent layers of discharge tubes are opposite; current-conducting plate fixing bases are respectively sleeved on the rotating shaft positioned on the outer side of the positive electrode fixing disc and the outer side of the negative electrode fixing disc; each current-conducting plate fixing base is fixedly connected with the inner wall of the adjacent sealable box body; an arc-shaped current-conducting plate is embedded in the inner side of each current-conducting plate fixing base, and a plurality of conductive contacts capable of conducting electricity with the arc-shaped current-conducting plates and the conductive ends of the discharge tubes at the same time are arranged on the positive pole fixing disc and the negative pole fixing disc in a penetrating mode.

Description

technical field [0001] The invention relates to a low-temperature plasma processing device capable of realizing online self-cleaning and a method for using the same, and belongs to the technical field of low-temperature plasma equipment. Background technique [0002] With the development of the industrial economy, the volatile organic waste gases produced by industries such as petroleum, pharmaceuticals, paints, printing and coatings are also increasing. These waste gases will not only stay in the atmosphere for a long time, but also spread and drift to distant places. It has caused great harm to the environment and human health. [0003] Low-temperature plasma is the fourth state of matter after solid, liquid, and gaseous states. It is a conductive fluid composed of electrons, ions, neutral particles, and free radicals. It has been widely used in industrial waste gas treatment and flue gas dust removal, Desulfurization has the advantages of low energy consumption, strong a...

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Problems solved by technology

The flushing liquid can be selected according to different project conditions, such as: 1% to 5% lye, 40°C to 80°C hot water, solution containing detergent, etc.", those skilled in the art can easily deduce that the patent The on-line cleaning mentioned in the technology does not refer to the meaning of cleaning while discharging. This patent cannot simultaneously perform plasma discharge work when cleaning the plasma discharge tube, so it cannot meet the requirements of continuous processing conditions at all; In addition, although the Chinese invention patent with the application number CN201710409665.1 discloses a method for online coke cleaning of a low-temperature plasma exhaust gas treatment device, it can be seen from the patent specification that the method needs to be closed before ultrasonic cleaning. Discharge disk power supply, close the exhaust gas inlet valve and outlet valve, obviously, this patented technology is still unable to carry out plasma discharge work at the same time when the plasma discharge tube is cleaned, and the online cleaning only refers to The meaning of coke cleaning without dismantling the discharge tube is still impossible to achieve the goal of cleaning while discharging

Although the low-temperature plasma processing device provided in the Chinese utility model patent with the application number CN201921797243.7, by setting at least two parallel plasma cabinets, when one of the plasma cabinets is cleaned, the remaining plasma cabinets can be cleaned. Working at the same time can meet the requirements of continuous processing conditions in a sense, but the patented device has problems such as bulky, high manufacturing costs, and limited use of space.

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