In-situ micro-nano indentation/scratch test platform
A scratch test, micro-nano technology, applied in the direction of testing material hardness, using stable tension/pressure testing material strength, measuring devices, etc., to achieve high accuracy, improve the application range, and high precision effects
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0030] see Figure 1-9, an in-situ micro-nano indentation / scratch test platform, including a coarse adjustment device, a fine adjustment device and a transmission device, the coarse adjustment device includes a base 1, an angle plate 2 and a worktable 3, and the angle plate 2 passes through a precision slide rail 4 Slidingly connected on the top of the base 1, the number of precision slide rails 4 is two, symmetrically distributed on both sides o...
PUM
![No PUM](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap