Broadband Steep Cutoff Wave-transmitting Structure and Radome Based on Frequency Selective Surface

A frequency-selective surface and wave-transparent structure technology, which is applied to antennas, antenna parts, radiation unit covers, etc., can solve the problem of narrow transition bands from suppression bands to transmission bands

Active Publication Date: 2022-08-09
AEROSPACE INST OF ADVANCED MATERIALS & PROCESSING TECH
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The wave-transmitting structure based on the frequency selective surface has been related to the wave-transmitting performance of the C, S, X, and Ku bands. At present, there is no wide-band wave-transmission in the Ku-band, and the transition zone from the suppression band to the transmission band. Narrower, that is, wave-transparent structures based on frequency-selective surfaces that meet steep cut-off characteristics

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Broadband Steep Cutoff Wave-transmitting Structure and Radome Based on Frequency Selective Surface
  • Broadband Steep Cutoff Wave-transmitting Structure and Radome Based on Frequency Selective Surface
  • Broadband Steep Cutoff Wave-transmitting Structure and Radome Based on Frequency Selective Surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] It should be noted that the embodiments in the present application and the features of the embodiments may be combined with each other in the case of no conflict. The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0025] It should be noted that the terminology used herein is for the purpose of describing specific em...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a broadband steep cut-off wave-transmitting structure and a radome based on a frequency selective surface, which solves the problem that it is difficult to satisfy the high-transmitting wave characteristic and the steep cut-off characteristic of the passband window in the Ku-band broadband range. The wave-transmitting structure includes first, second, and third wave-transmitting sub-structures arranged in sequence along its thickness direction, the first and second wave-transmitting sub-structures are arranged at intervals, and a first foam layer is formed therebetween, and the second and third wave-transmitting sub-structures are arranged at intervals. The first, second, and third wave-transmitting substructures are respectively composed of a first dielectric layer and a first frequency selective layer arranged thereon, and the second dielectric layer and a second frequency selective layer arranged on it. Layer composition and a third dielectric layer and a third frequency selective layer disposed thereon, the first, second and third frequency selective layers adopt the same frequency selective surface structure and are composed of periodically arranged slot-type units, and the slot-type units are composed of The annular structure ring is formed by a patch structure with a plurality of grooves spaced apart on the outer periphery at the inner center of the ring.

Description

technical field [0001] The invention provides a broadband steep cut-off wave-transmitting structure and a radome based on a frequency selective surface, belonging to the technical field of electromagnetic fields and microwaves. Background technique [0002] The frequency selective surface is a single-screen or multi-screen periodic array structure composed of a large number of passive resonant elements. The frequency selective surface element structure can be divided into two types: patch type element structure and slot type element structure. The two types are complementary in pattern and their frequency response characteristics are opposite. The patch-type unit structure is to arrange and paste some disconnected metal patterns on the dielectric board according to a certain period, and the slot-type unit structure is to arrange some gap patterns according to a certain period on a complete metal layer. In addition to its mechanical strength, dielectric loading can also affe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01Q15/00H01Q1/42
CPCH01Q15/0026H01Q1/424
Inventor 丛琳张春波樊君徐向华阳开华杨帆张昊
Owner AEROSPACE INST OF ADVANCED MATERIALS & PROCESSING TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap