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Automatic levelness adjustment method and adjustment mechanism

A level adjustment and adjustment mechanism technology, applied in the direction of control without feedback, can solve problems such as large operating errors, time-consuming manual level adjustment, and impact on the effect of instruments and equipment, and achieve simple and convenient operation and high precision Effect

Pending Publication Date: 2021-03-23
吴江华
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem solved by the present invention is: the existing manual adjustment level is time-consuming, and the human operation error is relatively large, and the operation errors of different operators are different, which will affect the effect of instruments and equipment.

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Embodiment Construction

[0024] In order to more clearly understand the above objects, features and advantages of the present invention, the present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that, in the case of no conflict, the embodiments of the present application and the features in the embodiments can be combined with each other.

[0025] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship that is usually placed when the product of the invention is used, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying References to devices or e...

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Abstract

The invention discloses an automatic levelness adjustment method. The method comprises the steps that: a level bubble is installed on a to-be-leveled device base mechanism; offset direction information of the device base mechanism is obtained by monitoring azimuth information of a bubble deviating from the center in the level bubble; and according to the offset direction information, the base mechanism is adjusted up and down in the corresponding direction until the bubble in the level bubble is located in the center of the level bubble. The invention further provides an automatic levelness adjustment structure applied to a to-be-leveled device base mechanism. The automatic levelness adjustment structure comprises a PLC control chip, level bubbles, a base corner level height adjustment mechanism and a position monitoring sensor which are installed on the to-be-leveled device base mechanism; the level bubbles are installed on the two sides of one corner of the base mechanism, the levelbubbles on the two sides are installed in a 90-degree mode; and the position monitoring sensor is an infrared sensor. The adjusting method and mechanism provided by the invention are simple and convenient to operate and high in adjusting precision; and the adjusting method and mechanism can be widely applied to measurement, control and installation of precise instruments and equipment.

Description

technical field [0001] The invention belongs to the technical field of device leveling methods, and in particular relates to an automatic level adjustment method and an adjustment mechanism. Background technique [0002] With the development of modern automation and intelligence, in the actual production and construction process, it is necessary to use some sophisticated measurement and control or auxiliary instruments and equipment, and these instruments and equipment have higher requirements for levelness in the process of use. At present, these The level of instruments and equipment is manually adjusted, and the position of the level bubble is continuously adjusted manually to make it centered. This manual adjustment is time-consuming, because it is a human operation, so the error is large, and the error of different operators is different. There are differences, which will have an impact on the effect of instruments and equipment. Contents of the invention [0003] Th...

Claims

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Application Information

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IPC IPC(8): G05D3/10
CPCG05D3/10
Inventor 吴江华
Owner 吴江华
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