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Multi-element layered hardened coating growth process

A hard coating and layered technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of reducing the appearance life of the product, reducing the gloss of the film layer, and roughening the surface of the film layer , to achieve the effects of inhibiting coarse growth, excellent mechanical properties, and low roughness

Inactive Publication Date: 2021-03-09
创隆实业(深圳)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the pursuit of gloss and color effects, the coating has various colors and high gloss, but the thickness of the film layer is thin, and the composition often deviates from the standard stoichiometric ratio, resulting in the mechanical properties of the film layer, that is, the daily use protection of the coated product. There are defects on the surface, and the phenomenon of film layer wear often occurs, which reduces the appearance life of the product
At present, the commonly used way to increase the hardness is to apply a single metal nitride or carbide film with a large thickness to optimize the protective performance of the film. However, due to the consistency of continuous growth of this film during the growth process, there is no It can avoid the roughening of the surface of the film layer, thereby reducing the glossiness of the film layer, and the overall decorative effect is poor

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A multi-layered hard coating growth process, comprising the following steps:

[0032] (1) Complete the liquid cleaning of the stainless steel substrate on the automatic cleaning line;

[0033] (2) Place the substrate in a magnetron sputtering coating machine for pre-evacuation;

[0034] (3) Glow cleaning is carried out in the magnetron sputtering coating machine;

[0035] (4) Film layer deposition is carried out in the magnetron sputtering coating machine, and the deposition of the film layer includes the deposition of a hard layer, and the carbide or nitride of a ternary or more than ternary metal is stacked to form a multilayer structure. layer structure;

[0036] (5) cooling out of the oven;

[0037] Wherein, the parameters of the film deposition are as follows:

[0038] Bottom layer: the deposition time is 10 minutes, the vacuum degree is 0.3Pa, the gas is argon, the volume flow rate of argon is 400sccm, the bias voltage is 100V, the duty cycle is 50%, a single ...

Embodiment 2

[0044] A multi-layered hard coating growth process, comprising the following steps:

[0045] (1) Complete liquid cleaning of the titanium alloy substrate on the automatic cleaning line;

[0046] (2) Place the substrate in a magnetron sputtering coating machine for pre-evacuation;

[0047] (3) Glow cleaning is carried out in the magnetron sputtering coating machine;

[0048] (4) Film deposition is carried out in the magnetron sputtering coating machine, and the deposition of the film layer includes the deposition of a hard layer, and the carbide or nitride of a ternary or more than ternary metal is stacked to form a multilayer structure. layer structure;

[0049] (5) cooling out of the oven;

[0050] Wherein, the parameters of the film deposition are as follows:

[0051]Bottom layer: the deposition time is 10 minutes, the vacuum degree is 0.3Pa, the gas is argon, the volume flow rate of argon is 400sccm, the bias voltage is 100V, the duty cycle is 50%, a single target Cr is...

Embodiment 3

[0057] A multi-layered hard coating growth process, comprising the following steps:

[0058] (1) Complete liquid cleaning of the zirconia ceramic substrate on the automatic cleaning line;

[0059] (2) Place the substrate in a magnetron sputtering coating machine for pre-evacuation;

[0060] (3) Glow cleaning is carried out in the magnetron sputtering coating machine;

[0061] (4) Film layer deposition is carried out in the magnetron sputtering coating machine, and the deposition of the film layer includes the deposition of a hard layer, and the carbide or nitride of a ternary or more than ternary metal is stacked to form a multilayer structure. layer structure;

[0062] (5) cooling out of the oven;

[0063] Wherein, the parameters of the film deposition are as follows:

[0064] Bottom layer: the deposition time is 10 minutes, the vacuum degree is 0.3Pa, the gas is argon, the volume flow rate of argon is 400sccm, the bias voltage is 100V, the duty cycle is 50%, a single tar...

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Abstract

The invention belongs to the technical field of physical vapor deposition (PVD) magnetron sputtering, and discloses a multi-element layered hardened coating growth process. The multi-element layered hardened coating growth process includes the following steps that (1) liquid cleaning of a base material is completed on an automatic cleaning line; (2) the base material is put into a magnetron sputtering coating machine for pre-vacuumizing; (3) glow cleaning is carried out in the magnetron sputtering coating machine; (4) film layer deposition is carried out in the magnetron sputtering coating machine, film layer deposition includes deposition of a hardening layer, three or more target materials are used in the deposition of the hardening layer, and carbides or nitrides of the obtained ternaryor more than ternary metal are of a multi-layer structure formed by stacking single-layer structures; and (5) the carbides or nitrides are cooled and discharged out of a furnace. According to the growth process, the nitrides or carbides of different materials are sequentially deposited in a layered mode in the film layer deposition process, layered stacking of the different materials is formed, the hardening effect is achieved, surface appearance coarsening growth is inhibited, and a coating with protection and decoration effects is formed on the surface of the base material.

Description

technical field [0001] The invention relates to the technical field of PVD magnetron sputtering, in particular to a multi-layered hard coating growth process. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, PVD) coating technology is used in many surface treatment and thin film material preparation, such as hard coating on the surface of the mold, protective coating on the surface of various parts, surface modification coating, conductive and Transparent coating, etc. [0003] Traditional decorative PVD technology is a conventional surface decorative treatment technology for the surface of stainless steel products and ceramic surfaces. Due to the pursuit of gloss and color effects, the coating has various colors and high gloss, but the thickness of the film layer is thin, and the composition often deviates from the standard stoichiometric ratio, resulting in the mechanical properties of the film layer, that is, the daily use protection of...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/02C23C14/06
CPCC23C14/352C23C14/0641C23C14/0635C23C14/0036C23C14/022
Inventor 彭长明
Owner 创隆实业(深圳)有限公司
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