Apparatus and method for compound turning of inner and outer circular end faces of thin-walled ellipsoid
A processing device, the technology of inner and outer circles, applied in the field of mechanical processing, can solve the problems of inability to meet the welding seam assembly angle, low clamping efficiency, etc., and achieve the effect of improving the dimensional accuracy of turning, easy operation, and accurate clamping and positioning.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0035] The present invention will be described in detail below in conjunction with specific embodiments. The following examples will help those skilled in the art to further understand the present invention, but do not limit the present invention in any form. It should be noted that those skilled in the art can make several changes and improvements without departing from the concept of the present invention. These all belong to the protection scope of the present invention.
[0036] According to a thin-walled ellipsoid top inner and outer circular end surface compound turning processing device and method, comprising a lower disc 1, a support vertical bar 2, an upper disc 3, a support inner tube 4, a compression ring 5, and an annular compression block 6 (Adopt hexagonal compression block in the present embodiment), outer pressure plate 7.
[0037] The lower disc is used for the supporting bottom surface of the turning device, and the lower disc is connected with the upper di...
PUM
Property | Measurement | Unit |
---|---|---|
Concentricity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com