Replenishing liquid capable of prolonging service life of hydrogen peroxide etching liquid

Abstract

The invention belongs to the technical field of materials for chemical etching of metal materials, and particularly relates to replenishing liquid capable of prolonging the service life of hydrogen peroxide etching liquid. Relative to the total weight of the whole composition, the replenishing liquid comprises the following components in percentage by weight: 4-20% of ammonium persulfate, 8-30% ofa chelating agent, 4-20% of a regulator, 2-10% of a multifunctional additive and ultrapure water for enabling the whole composition to reach 100%. After the replenishing liquid is added into the hydrogen peroxide etching liquid which is nearly invalid after continuous etching, the service life of the etching liquid can be obviously prolonged again, the purpose of reducing the use amount of the etching liquid can be achieved, the etching cost is obviously reduced, and the replenishing liquid has very high industrial popularization value.

Description

technical field [0001] The invention belongs to the technical field of materials for chemical etching of metal materials, and in particular relates to a replenishing liquid capable of improving the service life of a hydrogen peroxide-based etching liquid. Background technique [0002] The liquid crystal display includes a liquid crystal display panel and a backlight module, and the liquid crystal display panel includes a CF substrate, a TFT array substrate, and a liquid crystal material between the CF substrate and the TFT substrate. By supplying power to the TFT substrate or not, the direction of the liquid crystal molecules is controlled, and the light from the backlight module is projected onto the CF substrate to generate a picture. [0003] The liquid crystal panel is the heart of the liquid crystal display, accounting for more than 80% of the cost of the entire product, and its quality will directly affect the display's color, brightness, contrast, viewing angle and ot...

AI Technical Summary

Problems solved by technology

After the copper ion concentration of these etching solutions exceeds 7000ppm, if they continue to be used, they cannot maintain the required etching parameters such as qualified etching angles, so the etching solution must be replaced. In fact, the hydrogen peroxide in the etching solution is only consumed at this time. A small part, and a large amount of hydrogen peroxide and other components have not been fully utilized

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