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Display substrate and preparation method thereof, exposure alignment method

A technology for display substrates and alignment marks, which is used in optics, optomechanical equipment, and photoengraving processes for patterned surfaces. problem, to achieve the effect of reducing external light reflection, avoiding color mixing, and reducing the risk of easy disconnection

Active Publication Date: 2022-07-26
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the G2.5 generation line, after the black matrix is ​​coated, the alignment mark of the front layer cannot be recognized, and it cannot be automatically aligned on the exposure machine, and manual alignment is required, which reduces the yield and efficiency

Method used

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  • Display substrate and preparation method thereof, exposure alignment method
  • Display substrate and preparation method thereof, exposure alignment method
  • Display substrate and preparation method thereof, exposure alignment method

Examples

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Embodiment Construction

[0040] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and examples. The following examples are intended to illustrate the present invention, but not to limit the scope of the present invention. It should be noted that, the embodiments in the present application and the features in the embodiments may be combined with each other arbitrarily if there is no conflict.

[0041] The present invention provides a display substrate, comprising a substrate and a low-reflection film layer disposed on the substrate, the low-reflection film layer including a crystal base disposed on the substrate and a crystal base formed on the crystal base A plurality of pyramidal microstructures on the outer surface of the pyramidal microstructures are formed with a plurality of micropores. Thus, the automatic alignment of the display substrate on the exposure machine is realized.

[0042] The technical solution o...

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Abstract

Provided is a display substrate, a preparation method thereof, and an exposure alignment method. The display substrate includes a substrate and a low-reflection film layer disposed on the substrate, wherein the low-reflection film layer includes a low-reflection film layer disposed on the substrate. A crystal substrate and a plurality of pyramid microstructures formed on the crystal substrate, and a plurality of micropores are formed on the outer surface of the pyramid microstructure.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a display substrate, a preparation method thereof, and an exposure alignment method. Background technique [0002] The color filter substrate is the key material for realizing color display, and it occupies a very high cost in the display screen. In addition to affecting color, the color filter substrate also affects optical properties such as brightness and contrast. The main structure of the color filter substrate includes a substrate, a black matrix (BM), a color layer (RGB), a protective layer, a conductive film layer, a spacer column, and the like. The basic function of the black matrix is ​​to block light. The purpose is to improve the contrast, avoid the color mixing of the connected color layers, reduce the reflection of external light, and prevent the external light from irradiating the thin film transistor and increase the leakage current. Using the black matrix can e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00G03F9/00G09F9/30
CPCG03F7/0007G03F9/7073G03F9/7046G09F9/30
Inventor 周毅张立震徐胜何伟吴慧利赵雪飞贺芳李士佩顾仁权黎午升
Owner BOE TECH GRP CO LTD
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