A composite insulating reflective layer

Abstract

A composite insulating reflection layer (100), comprising: the composite insulation reflection layer (100) includes a plurality of dielectric pairs; at least one of the dielectric pairs includes a first material layer (110) with a first refractive index, and a second refractive index The second material layer (120) and the stress buffer layer (130) between them have a first refractive index greater than a second refractive index. The buffer layer (130) is used to reduce the production stress of the reflective film layer and improve the production yield of the chip process.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a composite insulating reflection layer. Background technique [0002] The existing distributed Bragg reflector (hereinafter referred to as: DBR) structure is made of periodic stacking of low refractive index and high refractive index materials, and the common low refractive index material is SiO 2 , high refractive index material is TiO 2 ; Usually the medium A / medium B that makes up the DBR can be any film or air, the old SiO 2 / TiO 2 The growth stress of the stacked film layer is relatively large, which is prone to cracking or peeling off of the film layer. [0003] see figure 1 , the existing DBR structure filling is a periodic stacking combination of two media with a large difference in refractive index, for example, the first material layer 110 and the second material layer 120 are stacked on each other, and the first material layer 110 and the second material...

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Problems solved by technology

[0002] The existing distributed Bragg reflector (hereinafter referred to as: DBR) structure is made of periodic stacking of low refractive index and high refractive index materials, and the common low refractive index material is SiO 2 , high refractive index material is TiO 2 ; Usually the medium A / medium B that makes up the DBR can be any film or air, the old SiO 2 / TiO 2 The growth stress of the stacked film layer is relatively large, which is prone to cracking or peeling off of the film layer

[0003] see figure 1 , the existing DBR structure filling is a periodic stacking combination of two media with a large difference in refractive index, for example, the first material layer 110 and the second material layer 120 are stacked on each other, and the first material layer 110 and the second material layer The material of 120 includes SiO 2 、TiO 2 , Nb 2 o 5 or Ta 2 o 5 Etc. Coating must be done with high energy. However, the stress between the film layer and the film layer under the high energy coating is relatively large, so it is easy to peel off or crack, and the roughness between the film and the film is relatively large, which is easy to cause scatter. Affect light extraction efficiency

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