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High-flux low-temperature plasma discharge equipment and method for decomposing hydrogen sulfide

A low-temperature plasma, high-flux technology, applied in the field of ion chemistry, can solve the problems of low hydrogen sulfide conversion rate, inability to achieve large flow, and high energy consumption, and achieve the effect of improving the conversion rate

Pending Publication Date: 2020-07-24
CHINA PETROLEUM & CHEM CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to provide a new high-pass Quantitative low-temperature plasma discharge equipment and method for decomposing hydrogen sulfide using the discharge equipment

Method used

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  • High-flux low-temperature plasma discharge equipment and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge equipment and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge equipment and method for decomposing hydrogen sulfide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0122] use figure 1 The shown device carries out hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the device are as follows:

[0123] Discharging equipment includes:

[0124] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0125] High-voltage electrodes, the high-voltage electrodes are arranged in the first cavity; in each layer structure containing high-voltage electrodes, the number of the high-voltage electrodes is 3 or 4, and each of the high-voltage electrodes is parallel to each other, forming The material of the high-voltage electrodes is a hollow stainless steel metal tube, and the dimensions of each of the high-voltage electrodes are the same;

[0126] A ground electrode, the ground electrode is arranged in the first cavity; in each layer structure containing the ground electrode, the number of the ground electrodes is 3 or 4, and each of the ground electrodes is paral...

Embodiment 2

[0139] This embodiment adopts figure 2 The shown device carries out hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the device are as follows:

[0140] Discharging equipment includes:

[0141] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0142] High-voltage electrodes, the high-voltage electrodes are arranged in the first cavity; in each layer structure containing high-voltage electrodes, the number of the high-voltage electrodes is 3 or 4, and each of the high-voltage electrodes is parallel to each other, forming The material of the high-voltage electrodes is a hollow graphite tube, and each of the high-voltage electrodes has the same size;

[0143] A ground electrode, the ground electrode is arranged in the first cavity; in each layer structure containing the ground electrode, the number of the ground electrodes is 3 or 4, and each of the ground electrodes is parallel to...

Embodiment 3

[0156] This embodiment is carried out using a discharge device similar to that of Embodiment 1. The difference is that the barrier medium in the discharge device of this embodiment is arranged on the outer surface of the high-voltage electrode and the ground electrode, that is, a double dielectric barrier discharge.

[0157] And the gap between two adjacent high-voltage-ground hybrid layers is 1.2 times the gap between the adjacent high-voltage electrodes and ground electrodes, L 2 The ratio to the thickness D1 of the barrier medium is 15:1;

[0158] The size of each of the high-voltage electrodes is the same as that of each of the ground electrodes, and the ratio of diameter to length is 1:100;

[0159] L 2 and the length of the discharge tube L 3 The ratio between them is 1:50;

[0160] The volume of the first cavity of the device of this embodiment is 3.2L.

[0161] Pass H into the first cavity of the discharge device from the first inlet 2 S / H 2 mixed gas, where H ...

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Abstract

The invention relates to the field of plasma chemistry, and discloses high-flux low-temperature plasma discharge equipment and a method for decomposing hydrogen sulfide. The high-flux low-temperatureplasma discharge equipment comprises a first cavity (1), a second cavity (2) which is nested in the first cavity (1), a high-voltage electrode (3) and a grounding electrode (4) which are arranged in the first cavity (1), and a blocking medium which is arranged on the outer surface(s) of the high-voltage electrode (3) and / or the grounding electrode (4). The high-flux low-temperature plasma discharge equipment provided by the invention has the advantages of high hydrogen sulfide conversion rate, low energy consumption and capability of realizing high-flow hydrogen sulfide treatment.

Description

technical field [0001] The invention relates to the field of plasma chemistry, in particular to a high-throughput low-temperature plasma discharge device and a method for decomposing hydrogen sulfide. Background technique [0002] Hydrogen sulfide (H 2 S) is a highly toxic and foul-smelling acid gas, which not only causes corrosion of metals and other materials, but also endangers human health and pollutes the environment. At present, large and medium-sized refineries in my country adopt the traditional Claus method (Claus) to treat 2 S tail gas, and sulfur recovery. The method recovers only the sulfur in hydrogen sulfide, but converts the valuable hydrogen into water. From the perspective of comprehensive utilization of resources, hydrogen resources have not been effectively utilized in the traditional hydrogen sulfide recovery process. [0003] Therefore, the decomposition of hydrogen sulfide into sulfur and hydrogen has gradually become a technical field that research...

Claims

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Application Information

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IPC IPC(8): C01B17/04C01B3/04H05H1/24
CPCC01B17/0495C01B3/04H05H1/2406Y02E60/36
Inventor 张铁张婧王林任君朋张树才王世强关银霞唐诗雅石宁徐伟刘全桢孙峰李亚辉周明川朱云峰
Owner CHINA PETROLEUM & CHEM CORP
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