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Low-temperature plasma discharge device and hydrogen sulfide decomposition method

A low-temperature plasma and discharge device technology, applied in the field of ion chemistry, can solve the problems of low hydrogen sulfide conversion rate and high energy consumption for decomposition

Pending Publication Date: 2020-07-07
CHINA PETROLEUM & CHEM CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] The purpose of the present invention is to overcome the defects of low hydrogen sulfide conversion rate and high decomposition energy consumption in the low-temperature plasma reactor provided by the prior art when it is used for the decomposition of hydrogen sulfide, and provide a new method that can improve the conversion rate of hydrogen sulfide And a low-temperature plasma reactor for reducing decomposition energy consumption and a method for decomposing hydrogen sulfide using the reactor

Method used

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  • Low-temperature plasma discharge device and hydrogen sulfide decomposition method

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Effect test

Embodiment 1

[0110] use figure 1 The shown low-temperature plasma reactor performs hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the low-temperature plasma reactor are as follows:

[0111] The reactor includes:

[0112] A first cavity, the first cavity is respectively provided with a first inlet, a gas product outlet and a liquid product outlet, wherein the side wall of the first cavity is formed by an external electrode, and forms the outer electrode The material is stainless steel foil, and the external electrode is grounded;

[0113] The second cavity, the second cavity is nested inside the first cavity, and the second cavity is respectively provided with a second inlet and a second outlet, and the side walls of the second cavity are all Formed by internal electrodes, the material forming the internal electrodes is stainless steel, and the internal electrodes are connected to a high-voltage power supply;

[0114] a third cavity, the ...

Embodiment 2

[0142] The present embodiment adopts the plasma reactor similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:

[0143] The outer electrode is arranged on the inner side wall of the first cavity, and the material forming the outer electrode is stainless steel metal foil; and the outer electrode is connected to a high-voltage power supply, and the inner electrode is grounded;

[0144] L 2 with the thickness of the barrier dielectric D 1 ratio of 1:1; and H 1 :L 3 =1:280.

[0145] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reactor from the first inlet. 2 S / H 2 mixed gas, where H 2 The volume fraction of S is 83%, the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge area is 18.4s, and the reaction pressure in the first cavity of the reactor is maintained at 0.07MPa in this embodiment. h 2 S / H 2 Aft...

Embodiment 3

[0149] The present embodiment adopts the plasma reactor similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:

[0150] The outer electrode is arranged around the inner side wall of the first cavity, the material forming the outer electrode is stainless steel metal foil, the outer electrode is grounded, and the inner electrode is connected to a high-voltage power supply;

[0151] L 2 with the thickness of the barrier dielectric D 1 ratio of 15:1; and H 1 :L 3 =1:400.

[0152] All the other specific structures and structural parameters are the same as in Example 1.

[0153] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reactor from the first inlet. 2 S / N 2 mixed gas, where H 2 The volume fraction of S is 30%, the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge area is 15.2s, and the reaction pressure...

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Abstract

The invention relates to the field of plasma chemistry, and discloses a low-temperature plasma discharge device and a hydrogen sulfide decomposition method; the discharge device comprises a first cavity (1), a second cavity (2), a third cavity (7), an inner electrode (3), an outer electrode (4) and a blocking medium (6); the inner electrode (3) and the outer electrode (4) are both solid electrodes, and the shapes of the inner electrode (3) and the outer electrode (4) are mutually matched to form an equal-diameter structure. According to the low-temperature plasma discharge device provided by the invention, the hydrogen sulfide decomposition process can be continuously and stably carried out under an obviously high hydrogen sulfide conversion rate, and the discharge device can realize long-period operation.

Description

technical field [0001] The invention relates to the field of plasma chemistry, in particular to a low-temperature plasma discharge device and a method for decomposing hydrogen sulfide. Background technique [0002] Hydrogen sulfide (H 2 S) is a highly toxic and foul-smelling acid gas, which not only causes corrosion of metals and other materials, but also endangers human health and pollutes the environment. At present, large and medium-sized refineries in my country adopt the traditional Claus method (Claus) to treat 2 S tail gas, and recover sulfur. The method recovers only the sulfur in hydrogen sulfide, but converts the valuable hydrogen into water. From the perspective of comprehensive utilization of resources, hydrogen resources have not been effectively utilized in the traditional hydrogen sulfide recovery process. [0003] Therefore, the decomposition of hydrogen sulfide into sulfur and hydrogen has gradually become a technical field that researchers at home and a...

Claims

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Application Information

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IPC IPC(8): C01B17/04C01B3/04
CPCC01B3/04C01B17/0495C01B2203/0266Y02E60/36
Inventor 任君朋张婧张铁李亚辉朱云峰孙峰石宁徐伟周明川
Owner CHINA PETROLEUM & CHEM CORP
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