Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Corn cultivation method

A cultivation method, corn technology, applied in grain cultivation, botanical equipment and methods, seed and rhizome treatment, etc., can solve problems such as unscientific fertilizer ratio, aggravated diseases and insect pests, uneven quality, etc.

Pending Publication Date: 2020-07-07
QIQIHAR BRANCH OF HEILONGJIANG ACADEMY OF AGRI SCI +1
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Moreover, in recent years, corn production has focused on profit and neglected land, and there is great pressure to increase yield per unit area.
In order to pursue stable and increased corn production, farmers apply more chemical fertilizers on each unit of land, and some land has already caused soil compaction; at the same time, simple fertilization methods, due to uneven quality and unscientific fertilizer ratios, aggravate the occurrence of diseases and insect pests and reduce resistance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] The cultivation method of corn specifically comprises the following steps:

[0031] (1) Variety selection: choose suitable growth period, high-quality, disease-resistant, insect-resistant, and stress-resistant corn varieties, and choose healthy, plump, and energetic corn kernels as seeds;

[0032] (2) Land preparation: Choose loam or sandy loam soil with convenient irrigation and drainage and above-average fertility as the planting area, clean up the planting area, remove weeds, stones and sundries, adjust the soil pH to 6, plow the land, and Dig vertical ditches from high to low in the terrain of the area, and then dig horizontal ditches along the horizontal direction, and the distance between two adjacent vertical ditches is 8m, and the distance between adjacent horizontal ditches is 4m. grid structure;

[0033] (3) Ditching and covering soil: row spacing adopts wide row and narrow row interval configuration, wide row width is 85 cm, narrow row width is 25 cm, ridge ...

Embodiment 2

[0039] The cultivation method of corn specifically comprises the following steps:

[0040] (1) Variety selection: choose suitable growth period, high-quality, disease-resistant, insect-resistant, and stress-resistant corn varieties, and choose healthy, plump, and energetic corn kernels as seeds;

[0041] (2) Land preparation: choose loam or sandy loam soil with convenient irrigation and drainage and above-average fertility as the planting area, clean up the planting area, remove weeds, stones and sundries, adjust the soil pH to 8, plow the land, and Dig vertical ditches from high to low in the terrain of the area, and then dig horizontal ditches along the horizontal direction, and the distance between two adjacent vertical ditches is 10m, and the distance between adjacent horizontal ditches is 6m. grid structure;

[0042](3) Ditching and covering soil: The row spacing is arranged at intervals between wide rows and narrow rows. The width of the wide row is 95 cm, the width of ...

Embodiment 3

[0048] The cultivation method of corn specifically comprises the following steps:

[0049] (1) Variety selection: choose suitable growth period, high-quality, disease-resistant, insect-resistant, and stress-resistant corn varieties, and choose healthy, plump, and energetic corn kernels as seeds;

[0050] (2) Land preparation: choose loam or sandy loam soil with convenient irrigation and drainage and above-average fertility as the planting area, clean up the planting area, remove weeds, stones and sundries, adjust the soil pH to 7, plow the land, and Dig vertical ditches from high to low in the terrain of the area, and then dig horizontal ditches along the horizontal direction, and the distance between two adjacent vertical ditches is 9m, and the distance between adjacent horizontal ditches is 5m. grid structure;

[0051] (3) Ditching and covering soil: the row spacing is arranged at intervals between wide rows and narrow rows, the width of the wide row is 90 cm, the width of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a corn cultivation method. The corn cultivation method specifically comprises the following steps: (1) variety selection: a step of selecting a proper corn variety with good quality, disease resistance, pest resistance and stress resistance in a growth period; (2) land preparation: a step of cleaning a planting area, removing weeds, stones and sundries, adjusting the pH value of soil, plowing the soil, and digging drainage ditches; (3) ditching and soil covering: a step of arranging wide rows and narrow rows at intervals, applying decomposed farmyard manure according tothe area of a land parcel, uniformly spreading the farmyard manure into furrows, covering the furrows with loam, and compacting the loam; (4) precision sowing: a step of sowing corn seeds in a double-row wide-narrow-hole double-grain mode at the inner sides of two ridges, and compacting the soil after sowing is finished; and (5) field management, which comprises field management in a seedling stage, field management in an ear stage and field management in a flower and grain stage. According to the corn cultivation method provided by the invention, a density and a distance are increased; ventilation and light transmission are achieved; moisture is preserved; soil moisture is increased; full stand is realized; the fertilizer efficiency is improved, so plant strengthening is achieved; the corn cultivation method is especially applicable to northeast regions in China; whole-process mechanization is achieved, so the purposes of labor saving, fertilizer saving, water saving and high yield are achieved.

Description

technical field [0001] The invention relates to the technical field of agricultural product planting, and more specifically relates to a method for cultivating corn. Background technique [0002] Corn is an important food crop and feed crop, and it is also the crop with the highest total output in the world. Its planting area and total output are second only to rice and wheat. Because corn is rich in protein, fat, vitamins, trace elements and cellulose, it is known as a longevity food and has great potential for developing foods with high nutrition and high biological functions. [0003] In my country, the planting distribution area is vast, and the total annual output is large. In 2013, the output of ordinary corn in my country reached 215 million tons. The Northeast region has a vast territory and is the largest main producing area of ​​corn. However, the climate conditions in the Northeast region are harsh, and the corn will catch up with the high incidence of drought du...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G22/20A01C1/00A01G13/00A01N43/38A01N59/00A01N31/02A01P21/00
CPCA01C1/00A01G13/00A01N31/02A01N43/38A01N59/00A01G22/20
Inventor 王俊强丁昕颖韩业辉马宝新刘海燕于运凯周超孙培元王俊河王泽胤于海林刘峰王立达袁明曲忠诚马波王宇先于洋宫秀杰郝玉波
Owner QIQIHAR BRANCH OF HEILONGJIANG ACADEMY OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com