Method for performing high-contrast imaging on transparent medium surface etching or embossment pattern

Abstract

The invention provides a method for carrying out high-contrast imaging on a transparent medium surface etching or embossment pattern, which is characterized by comprising the following steps of: S1, constructing a periodically arranged shading plate; S2, constructing a special light source by utilizing a white surface light source and the construction period arrangement shading plate; S3, the special light source is adopted to illuminate an imaging target; S4, adjusting a lens of the camera to focus on the surface of the transparent medium; and S5, adjusting the exposure time of a lens aperture and a camera, and limiting the imaging depth of field within a range of two centimeters before and after the etched surface of the transparent medium so as to reduce the interference of the background on imaging. According to the method, a special light source is constructed for active illumination to improve the imaging stability; the imaging depth of field is controlled by adjusting the aperture, imaging contrast is improved, and background interference is reduced.

Description

technical field [0001] The present invention specifically relates to a method for high-contrast imaging for etching or embossing patterns on the surface of a transparent medium. Background technique [0002] Etching or embossing patterns on the surface of transparent media widely exist in the field of industrial production. Whether such targets can be effectively imaged is critical to the improvement of the level of automated detection in related production links. Because the medium itself is transparent, it is difficult to form an effective reflection of the illumination light, and the imaging contrast is relatively weak, especially in the case of shallow etching (or relief) depth, the target is easily submerged by the background, making it difficult for ordinary imaging solutions to obtain a clear image of the target , which has become an urgent problem to be solved in related applications. [0003] At present, the commonly used imaging methods for etched (or embossed) pa...

AI Technical Summary

Problems solved by technology

Due to the transparency of the medium itself, it is difficult to effectively reflect the illumination light, and the imaging contrast is relatively weak, especially in the case of shallow etching (or relief) depth, the target is easily submerged by the background, making it difficult to obtain a clear image of the target with ordinary imaging solutions , has become an urgent problem to be solved in related applications

[0003] At present, the commonly used imaging methods for etching (or relief) patterns on the surface of transparent media mainly rely on active lighting. Due to the low contrast of the target itself, it is difficult to obtain good contrast only by relying on natural light or ordinary light sources.

At the same time, the transparent medium itself lacks texture information, and the imaging contrast is low

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