Burner for horseshoe flame glass kiln, glass kiln and burning method
A glass furnace and combustion method technology, applied in glass furnace equipment, glass manufacturing equipment, manufacturing tools, etc., can solve the problems of unsuitable application of horseshoe flame glass furnace, relatively complicated process, difficult operation, etc., and achieve emission reduction The effect is obvious, the process is simple, and the effect of avoiding local high temperature
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0041] Use the burner of the present invention to burn in a horseshoe flame kiln of 160 tons per day, the flow velocity of the combustion-supporting air entering the kiln is 10m / s, the open rate of the cross-sectional area of the gas outer chamber 4 is 50%, and the flame coverage area is I, Ⅱ, Ⅲ and Ⅳ; the nitrogen oxide emission concentration is 1600 mg / standard cubic meter.
Embodiment 2
[0043] Use the burner of the present invention to burn in a horseshoe flame kiln of 160 tons per day, the flow velocity of the combustion-supporting air entering the kiln is 10m / s, the open rate of the cross-sectional area of the gas outer chamber 4 is 40%, and the flame coverage area is I, Ⅱ, Ⅲ and Ⅳ; the nitrogen oxide emission concentration is 1800 mg / standard cubic meter.
Embodiment 3
[0045] Use the burner of the present invention to burn in a horseshoe flame kiln of 160 tons per day, the flow velocity of the combustion-supporting air entering the kiln is 10m / s, the open rate of the cross-sectional area of the gas outer cavity 4 is 60%, and the flame coverage area is I, Ⅱ, Ⅲ and Ⅳ; the nitrogen oxide emission concentration is 1900 mg / standard cubic meter.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com