Bright and clean x-ray source for x-ray based metrology
一种X射线、光源的技术,应用在巨大电流的X射线管、X射线管、X射线设备等方向,能够解决辐射低能量、限制利用等问题
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[0024] Reference will now be made in detail to prior art examples and some embodiments of the invention, examples of which are illustrated in the accompanying drawings.
[0025] Methods and systems for x-ray-based semiconductor metrology utilizing clean, rigid x-ray radiation sources are described herein. More specifically, laser-produced plasma (LPP) light sources produce high brightness (that is, greater than 10 13 photon / (second.mm 2 .mrad 2), hard x-ray exposure. To achieve this high brightness, the LPP light source directs a highly focused (e.g., less than 10 micron illumination spot on the target), extremely short duration (e.g., less than 2 picoseconds) laser beam to a dense xenon target in liquid or solid state. The interaction of a focused laser pulse with a high-density xenon target induces a plasma. Radiation from the plasma is collected by collection optics and directed to the sample being measured. Due to the use of non-metallic target materials, the resultin...
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