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Ultrahigh vacuum infrared spectrum in-situ analysis system

An ultra-high vacuum and infrared spectroscopy technology, which is applied in the direction of material analysis, analysis materials, and measuring devices by optical means, can solve problems such as affecting the accuracy of test results, contaminating the surface of materials, etc., to solve matching and performance compatibility problems, The effect of avoiding pollution

Pending Publication Date: 2020-03-03
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the water and carbon dioxide in the air not only have infrared absorption, but also may contaminate the surface of the material, and even cause chemical reactions, affecting the accuracy of the test results

Method used

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  • Ultrahigh vacuum infrared spectrum in-situ analysis system
  • Ultrahigh vacuum infrared spectrum in-situ analysis system
  • Ultrahigh vacuum infrared spectrum in-situ analysis system

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Embodiment Construction

[0018] Such as figure 1 , 2 As shown, an ultra-high vacuum infrared spectrum in-situ analysis system includes an infrared spectrometer 2, and the system also includes a sample control device 6 and an ultra-high vacuum acquisition device connected to the ultra-high vacuum sample chamber 1; the ultra-high vacuum sample chamber 1 There are ultra-high vacuum KBr infrared windows 7 on both sides; the ultra-high vacuum obtaining device includes an oil-free mechanical pump 4, a turbo molecular pump 5 and a sputtering ion pump; the sample control device 6 is controlled by a differential head through a shaft and a rod to control the friction below it The special sample holder is sealed with the ultra-high vacuum sample chamber 1 by metal, and the force and movement are transmitted through the bellows.

[0019] The ultra-high vacuum sample chamber 1 is connected with the space tribology experiment system through the gate valve 3 provided thereon.

[0020] The ultimate vacuum of the ul...

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Abstract

The invention discloses an ultrahigh vacuum infrared spectrum in-situ analysis system. The system comprises an infrared spectrometer. The system further comprises a sample control device and an ultrahigh vacuum obtaining device which are connected with an ultrahigh vacuum sample chamber; ultrahigh vacuum KBr infrared windows are formed at two sides of the ultrahigh vacuum sample chamber; the ultrahigh vacuum obtaining device comprises an oil-free mechanical pump, a turbo molecular pump and a sputtering ion pump; the sample control device controls a sample holder below the sample control devicethrough a micrometer head and by means of a shaft and a rod; the sample control device is in sealed connection with the ultrahigh vacuum sample chamber through metal; and the sample control device transmits forces and motion through a corrugated pipe. With the ultrahigh vacuum infrared spectrum in-situ analysis system of the invention adopted, the infrared spectrum in-situ analysis of a materialsurface in a simulated space environment is realized.

Description

technical field [0001] The invention relates to an ultra-high vacuum infrared spectrum in-situ analysis system, which is applied to the in-situ infrared spectrum analysis of material surface microstructures in a simulated space environment, and belongs to the technical field of space science and surface analysis. Background technique [0002] Infrared spectrometer is a powerful tool for analyzing molecular composition and structure by using the absorption characteristics of substances to infrared radiation of different wavelengths. The advantages of infrared spectroscopy are high sensitivity, accurate wave number and good repeatability. Applying infrared spectrometers to the field of space science and technology can accurately correlate changes in the physical and chemical properties of materials in space environments with their surface microstructures, and improve their space environment adaptability by optimizing material microstructures. However, the water and carbon dio...

Claims

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Application Information

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IPC IPC(8): G01N21/3563
CPCG01N21/3563
Inventor 严洁刘建高平孙晓军刘维民
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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