Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Spliced nanoimprint template and repairing method of splicing seam thereof, and manufacturing method of spliced nanoimprint template

A technology of nano-imprinting and repairing method, which is applied in the field of nano-imprinting to solve the problem of demolding and improve the quality

Active Publication Date: 2020-02-21
BOE TECH GRP CO LTD
View PDF13 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the shortcomings of the existing methods, this application proposes a spliced ​​nano-imprint template, a repair method for its splicing seam and a manufacturing method thereof, to solve the problem of spliced ​​nano-imprint templates existing in the prior art. technical problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Spliced nanoimprint template and repairing method of splicing seam thereof, and manufacturing method of spliced nanoimprint template
  • Spliced nanoimprint template and repairing method of splicing seam thereof, and manufacturing method of spliced nanoimprint template
  • Spliced nanoimprint template and repairing method of splicing seam thereof, and manufacturing method of spliced nanoimprint template

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057]The present application is described in detail below, and examples of embodiments of the present application are shown in the drawings, wherein the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. Also, detailed descriptions of known technologies will be omitted if they are not necessary to illustrate the features of the present application. The embodiments described below by referring to the figures are exemplary only for explaining the present application, and are not construed as limiting the present application.

[0058] Those skilled in the art can understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in commonly used dictionaries, should be u...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
Login to View More

Abstract

The embodiment of the invention provides a spliced nanoimprint template and a repairing method of a splicing seam thereof, and a manufacturing method of a spliced nanoimprint template. The repairing method of the splicing seam of the spliced nanoimprint template comprises the steps of: providing a nanoimprint splicing plate, wherein the nanoimprint splicing plate comprises a substrate and a plurality of splicing modules located on the substrate, a splicing seam is formed between every two adjacent splicing modules, and each splicing module comprises a unit pattern; forming a repairing adhesivelayer at least at each splicing seam; and performing graphical processing on the repair adhesive layers to form a repair module, wherein the repair module comprises a unit pattern. According to the embodiment of the invention, the repairing of the splicing seam of the spliced nanoimprint template can be achieved, so that the seamless spliced nanoimprint template is manufactured; and moreover, theseamless spliced nanoimprint template is beneficial to improving the quality of a photoelectric device, and solves the demoulding problem caused by splicing seams.

Description

technical field [0001] The present application relates to the technical field of nanoimprinting, in particular, the application relates to a spliced ​​nanoimprinting template, a method for repairing its splicing seam and a manufacturing method thereof. Background technique [0002] As a new type of high-efficiency and high-yield microstructure preparation technology, nanoimprint technology can prepare microstructures of micron and nanoscale, and is widely used in optoelectronic devices, semiconductors and other technical fields. [0003] At present, the method for preparing a large-area nanoimprint template is mainly to splice multiple small-area nanoimprint templates to form a spliced ​​nanoimprint template. However, the splicing of small-area nanoimprint templates cannot achieve seamless splicing. Therefore, there are usually splicing seams in spliced ​​nanoimprint templates, and these splicing seams are generally on the micron scale. [0004] Due to the lack of structure...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002B29C73/02B29C2035/0838B29C65/526G03F7/2002H01L21/027H01L21/0275
Inventor 路彦辉李多辉周雪原
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com