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Drawing device and drawing method

A technology of character data and data, applied in the field of drawing devices, can solve problems such as incomplete recording of exposure information

Active Publication Date: 2022-08-02
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the amount of exposure information recorded by the manufacturing department is large, there is a problem that the required exposure information cannot be completely recorded in the secured information area.

Method used

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  • Drawing device and drawing method
  • Drawing device and drawing method
  • Drawing device and drawing method

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Embodiment Construction

[0062] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[0063]

[0064] figure 1 It is a figure which shows the schematic structure of the drawing apparatus 1 of this invention. The drawing device 1 is a direct drawing device that draws a desired circuit pattern on the substrate S by sequentially performing partial exposure on the substrate S such as a printed circuit board by irradiating the laser light for exposure while relatively scanning. Furthermore, in figure 1 And in each of the following figures, the size and number of each part are exaggerated or simplified as necessary for ease of understanding.

[0065] The drawing device 1 includes, as main components, a data processing unit 2 that generates drawing data, and an exposure unit 3 that performs drawing (exposure) on the substrate S based on the drawing data. In addition, the data processing unit 2 and the exposure unit 3 may be provided integrally, o...

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Abstract

The present invention provides a drawing device and a drawing method capable of drawing necessary information on an information area. The pattern data (PD) recorded in the vector format is converted into a raster format and subjected to correction processing based on the deformation of the substrate (S) to generate post-correction drawing data (HD). Designated character data (RD) representing exposure information is synthesized into post-correction drawing data (HD) to generate final drawing data (DD). In the exposure unit (3), the laser light modulated based on the final drawing data (DD) is irradiated on the substrate (S) to perform drawing processing. The character font of the candidate character is bitmap-converted in advance and prepared as character data (CD) so that the character data (CD) converges to the size of the divided area obtained by dividing the information area displaying the exposure information by the maximum predetermined number of characters middle. The designated characters designated as exposure information are replaced with prepared character data (CD) and composited into the information area.

Description

technical field [0001] The present invention relates to a drawing device and a drawing method for drawing a pattern on a printed substrate, a semiconductor substrate, a glass substrate, etc. (hereinafter, simply referred to as a "substrate") on which a photoreceptor is formed based on drawing data. Background technique [0002] It is known to have an exposure apparatus that draws a desired circuit pattern on a substrate by irradiating a substrate on which a photoreceptor such as a resist is formed with a laser while scanning, thereby continuously exposing locally. Such an exposure apparatus is known as a direct drawing apparatus (direct drawing apparatus) (for example, a direct drawing apparatus) because a circuit pattern is directly drawn on a substrate by irradiating laser light modulated based on drawing data without using a mask. Refer to Patent Documents 1 and 2). [0003] Patent Document 1: Japanese Patent Laid-Open No. 2010-204421 [0004] Patent Document 2: Japanes...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2053G03F7/2055G03F7/704G03F7/70116G03F7/70991G03F7/20
Inventor 鉈落信也八坂智
Owner DAINIPPON SCREEN MTG CO LTD
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