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Aspheric parameter error interference measurement method and system combined with astigmatism method positioning

A technology of interferometric measurement and positioning system, which is applied in the direction of measuring devices, instruments, and optical devices, etc. It can solve the problems of very high precision requirements for the assembly and adjustment of two-way pinholes and microscopic objective lenses, and a large system, and achieves simple structure and high precision. High, easy to adjust the effect

Active Publication Date: 2020-01-14
BEIJING INSTITUTE OF TECHNOLOGYGY
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Problems solved by technology

[0006] However, the laser differential confocal positioning system (not included in this patent) adopted by this method generally includes: a confocal lens, a beam splitter and two sets of pinholes with identical parameters, a microscope objective lens and a detector. The precision of the assembly and adjustment of the pinhole and the microscope objective lens is very high, and the system is relatively large

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  • Aspheric parameter error interference measurement method and system combined with astigmatism method positioning
  • Aspheric parameter error interference measurement method and system combined with astigmatism method positioning

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Embodiment Construction

[0028] After long-term thinking and trial and error, the applicant replaced the existing patented laser differential confocal positioning system with the astigmatic positioning system. The astigmatism positioning system includes: polarization beam splitter, quarter-wave plate, focusing objective lens, converging lens, cylindrical mirror and four-quadrant detector. It has the advantages of simple structure, convenient installation and adjustment, and can avoid laser differential common The influence of the adjustment error of the focal system on the measurement accuracy. However, this is not a simple replacement, but a completely new change to the entire aspheric error interferometry method and system.

[0029] Such as figure 1 As shown, the aspheric parameter error interferometry method combined with astigmatism method positioning includes the following steps:

[0030] (1) Obtain the nominal parameters of the measured aspheric surface, use the optical design software to desi...

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Abstract

The invention discloses an aspheric parameter error interference measurement method and system based on astigmatism method positioning. An aspheric parameter error interference measurement system is established by combining an astigmatism positioning system, so a complex laser differential confocal system does not need to be built, the influence of the adjustment error of the laser differential confocal system on the measurement precision is avoided, and the measurement precision of the surface type parameter error of the aspheric surface is further improved; moreover, the non-contact, full-aperture and high-precision measurement can be achieved, and the system has the advantages of simple structure and convenient adjustment.

Description

technical field [0001] The invention relates to the technical field of optical aspheric surface measurement, in particular to an aspheric surface parameter error interferometric measurement method combined with astigmatic method positioning and an aspheric surface parameter error interferometric measurement system combined with astigmatic method positioning. Background technique [0002] The surface parameters of an aspheric surface include the vertex curvature radius and the quadric surface constant. These two parameters together determine the shape characteristics of the aspheric surface. Among them, the radius of curvature of the vertex not only affects the profile of the aspheric surface, but also determines the basic properties of the aspheric surface, which in turn affects the aberration and imaging quality of the optical system; and the quadric surface constant It is the classification basis of aspheric surface. Accurate measurement of surface parameter errors is ver...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B11/255G01B11/02
CPCG01B11/02G01B11/2441G01B11/255
Inventor 郝群胡摇陶鑫宁悦文
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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